Imprint Apparatus Stage Tilt Compensation via Force Feedback
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Solution Overview
Problem
The existing imprint apparatuses face challenges in maintaining precise alignment and reducing shifts in the relative positions of the mold and substrate due to stage tilting during contact and separation, which can lead to pattern damage and prolonged settling times due to the viscosity of the imprint material.
Innovation Solution
An imprint apparatus with a movable stage and a control unit that adjusts the relative positions of the mold and substrate based on contacting and separating forces, and distance from a reference position to minimize shifts, using feedback control and feed-forward corrections to maintain alignment and stability during the imprint process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the imprint apparatus brings the mold and imprint material into contact to form a pattern, then the pattern formation is achieved, but the stage tilts due to contacting force causing shift in relative positions of mold and substrate
Solution Approach 1:
The control unit applies a preliminary counteracting force through the stage driving unit to offset the stage tilt caused by the contacting force between mold and imprint material. By detecting the relative position shift and calculating the counteracting force based on the distance from reference position, the system prevents the tilt effect before it significantly impacts alignment precision.
Solution Approach 2:
The system continuously detects the relative position between mold and shot region, feeds this information back to the control unit, which then adjusts the stage position to compensate for tilt. This closed-loop feedback mechanism maintains alignment precision despite the contacting force causing stage tilt.
2Productivity
If the imprint apparatus separates the mold from cured imprint material, then the pattern is released, but the stage tilts due to separating force causing shift in relative positions and pattern damage
Solution Approach 1:
The control unit applies a preliminary counteracting force through the stage driving unit to offset the stage tilt caused by the separating force between mold and cured imprint material. By detecting the relative position shift and calculating the counteracting force based on the distance from reference position, the system prevents the tilt effect before it causes pattern damage or position shifts.
Solution Approach 2:
The system continuously detects the relative position between mold and substrate, feeds this information back to the control unit, which then adjusts the stage position to compensate for tilt during separation. This closed-loop feedback mechanism maintains pattern integrity and position accuracy despite the separating force.
3Force
If the stage tilts during contact, then the contacting force is applied, but the relative positions fluctuate slowly due to viscosity of imprint material requiring considerable time to restore
Solution Approach 1:
The control unit proactively adjusts the stage position to a corrected location before the viscosity-induced fluctuations fully develop. By calculating the expected shift based on contacting force and distance from reference position, and preemptively positioning the stage, the system reduces the settling time required for the imprint material to stabilize.
Solution Approach 2:
The system detects relative position shifts in real-time and provides continuous feedback to the stage driving unit, which actively compensates for the slow fluctuations caused by imprint material viscosity. This active feedback control significantly reduces the settling time compared to passive restoration.
Data Source
AI summary
The present invention provides an imprint apparatus which forms a pattern in an imprint material on a shot region of a substrate by using a mold, the apparatus comprising a stage that can move while holding the substrate, and a control unit configured to control relative positions of the mold and the shot region so as to reduce a shift in the relative positions caused by tilting the stage when bringing the mold and the imprint material into contact with each other, based on a contacting force of bringing the mold and the imprint material into contact with each other, and a distance from a reference position of the substrate to the shot region.