Imprint Stamp Manufacturing via Resist Segmentation
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Solution Overview
Problem
Manufacturing an imprint stamp capable of forming both fine wire grid polarizer patterns and light blocking patterns simultaneously is challenging due to the larger size of the light blocking patterns compared to the fine wire grid patterns.
Innovation Solution
A method involving the formation of an imprint resist on a sample substrate with a fine protrusion pattern, where the imprint stamp is pressed and cured, allowing the cured imprint resist to separate from the substrate, ensuring a strong bond between the resist and the pattern, thus enabling the creation of an imprint stamp with both fine and normal patterns, including wire grid and black matrix patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If an imprint stamp is designed to form both fine wire grid patterns and large light blocking patterns, then the manufacturing process is simplified and productivity is improved, but the manufacturing precision and reliability of the stamp deteriorate due to the difficulty of maintaining consistent quality across different pattern sizes
Solution Approach 1:
The stamp substrate is divided into multiple regions: a first region containing fine protrusions for wire grid patterns and a second region with different protrusion characteristics for light blocking patterns. This segmentation allows each region to be optimized independently for its specific pattern type while being manufactured as a single integrated stamp, resolving the contradiction between productivity improvement and precision maintenance.
2Device complexity
If the imprint resist is pressed with the stamp to form both fine and normal patterns simultaneously, then the number of manufacturing steps is reduced, but the bonding force requirements become more complex to ensure proper pattern transfer
Solution Approach 1:
The stamp is designed with local quality variations: the first region has fine protrusions with specific dimensional characteristics optimized for wire grid patterns, while the second region has protrusions with different characteristics optimized for light blocking patterns. This allows the bonding force and pressing conditions to be optimized locally for each pattern type, enabling simultaneous formation of both pattern types without compromising the strength or precision of either.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the simultaneous formation of fine wire grid polarizer and light blocking patterns without additional photolithography processes, reducing design costs and improving manufacturing efficiency.
Implementation Method 1
The imprint resist may include at least one of thermosetting resin and photocurable resin
Implementation Method 2
The imprint resist may include at least one of thermosetting resin and photocurable resin
Implementation Method 3
a bonding force between the cured imprint resist and the fine protrusion pattern is greater than a releasing force between the cured imprint resist and the fine protrusion pattern
Data Source
AI summary
A method of manufacturing an imprint stamp including forming an imprint resist only in a second area of a sample substrate including a first area and the second area, pressing the imprint resist with the imprint stamp and curing the imprint resist, in which the imprint stamp includes a fine protrusion pattern that corresponds to the first area and the second area of the sample substrate, and separating the imprint stamp from the sample substrate such that a portion of the fine protrusion pattern corresponding to the second area is separated from the imprint stamp by the cured imprint resist.