Imprint Apparatus Substrate Deformation for Bubble-Free Contact
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Solution Overview
Problem
The imprint technique faces challenges in reducing pattern defects caused by trapped bubbles between the mold and the imprint material on the substrate, particularly in peripheral shot regions where the contact between the mold and the imprint material is incomplete, leading to unfilled defects.
Innovation Solution
An imprint apparatus that deforms the substrate into a convex shape using controlled suction pressure, allowing the mold to contact the imprint material from the center of the peripheral shot regions, thereby preventing bubble trapping and ensuring consistent pattern formation across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the mold is brought into contact with the imprint material from the center to the outside to reduce bubbles, then pattern defects are reduced, but the effective substrate area for imprinting is reduced due to the substrate edge effect
Solution Approach 1:
The substrate is pre-deformed into a convex shape along the Z-axis before the mold contact process begins. This preliminary deformation ensures that even peripheral regions of the substrate will be in proper contact with the mold during imprinting, eliminating the edge effect and allowing the entire substrate area to be effectively utilized for pattern transfer.
Solution Approach 2:
The invention introduces a Z-axis dimension to the substrate preparation process by deforming the substrate in the vertical direction. This dimensional change creates a convex substrate surface that compensates for the substrate edge effect, enabling complete coverage of the substrate area during the subsequent XY-plane imprinting process.
2Productivity
If the substrate edge effect is considered to expand the shot region, then productivity increases, but pattern defects increase due to incomplete contact in peripheral regions
Solution Approach 1:
The substrate is pre-deformed into a convex shape along the Z-axis before the mold contact process begins. This preliminary deformation ensures that even peripheral regions of the substrate will be in proper contact with the mold during imprinting, eliminating the edge effect and allowing the entire substrate area to be effectively utilized for pattern transfer.
Solution Approach 2:
The invention changes the physical parameter of the substrate by deforming it along the Z-axis to create a convex shape. This parameter change transforms the flat substrate into a three-dimensional convex surface, which fundamentally alters the contact mechanics during imprinting and eliminates the substrate edge effect in peripheral regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances productivity by reducing pattern defects and ensuring consistent imprint performance in both central and peripheral shot regions, maximizing the effective substrate area for pattern transfer.
Implementation Method 1
a substrate holder configured to hold the substrate by suction
Implementation Method 2
controlling, based on surface shape data of the substrate held by the substrate holder, a pressure at which the substrate holder sucks the substrate
Data Source
AI summary
An imprint apparatus includes a mold holder that holds a mold, a substrate holder that holds a substrate by suction, a driving device that brings the mold into contact with an imprint material on the substrate by relatively bringing the mold holder and the substrate holder close to each other, and a controller. The controller controls the driving device so as to bring the mold into contact with the imprint material in a state in which the substrate is deformed into a convex shape with respect to the mold by controlling pressures inside the plurality of suction regions based on surface shape data of the substrate held by the substrate holder.