Imprint Substrate Deformation Control via Crystal Orientation
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Solution Overview
Problem
The existing substrate deformation methods for creating a convex shape towards a mold in imprint processes result in varying deflection amounts across shot regions, leading to potential collisions and damage, and require trial-and-error adjustments for controlling contact conditions, which degrades productivity.
Innovation Solution
An imprint apparatus with a substrate holder and deformation mechanism that controls substrate deformation based on crystal orientation and target shot region information, using a controller to adjust pressure distribution for consistent substrate shaping and prevent collisions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a substrate deformation method is employed to make the substrate have a convex shape toward the mold, then the substrate contact condition is improved, but the deflection amount varies among shot regions causing collision risk and mold damage
Solution Approach 1:
The substrate deformation mechanism applies different deformation amounts to different shot regions based on their respective deflection characteristics. The controller selectively deforms specific regions of the substrate according to stored deflection information for each shot region, ensuring that each region achieves the appropriate convex shape without excessive deflection that would cause collision.
2Reliability
If conditions for controlling the contact between substrate and mold are adjusted by trial and error for each shot region, then collision risk is reduced, but productivity degrades greatly
Solution Approach 1:
The system performs preliminary measurement of deflection amounts for each shot region before the actual imprint process. The controller stores this deflection information in advance and uses it to control the substrate deformation mechanism during production, eliminating the need for trial-and-error adjustments while maintaining collision prevention.
3Ease of manufacture
If the substrate is deformed to have a convex shape toward the mold, then the imprint process is enabled, but deflection variation increases collision possibility and causes pattern defects
Solution Approach 1:
The system measures the actual deflection amount of each shot region and uses this feedback information to control the substrate deformation mechanism. The controller adjusts the deformation based on the measured deflection, ensuring that the substrate achieves the necessary convex shape for the imprint process while preventing excessive deflection that would cause collision or pattern defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves productivity by ensuring consistent substrate deformation across shot regions, reducing the risk of mold damage and pattern defects, and allowing for precise control of the imprint process without the need for trial-and-error adjustments.
Implementation Method 1
using a controller to control the deformation of the substrate by the substrate deformation mechanism in accordance with orientation information related to a crystal orientation of the substrate and a target shot region
Data Source
AI summary
An imprint apparatus performs an imprint process for forming a pattern of a cured product of an imprint material on a substrate by using a mold. The apparatus includes a substrate holder configured to hold the substrate, a substrate deformation mechanism configured to deform the substrate so the substrate will have a convex shape toward the mold in a state in which the substrate is held by the substrate holder, and a controller configured to control the deformation of the substrate by the substrate deformation mechanism in accordance with orientation information related to a crystal orientation of the substrate and a target shot region on which the imprint process is to be performed among a plurality of shot regions on the substrate.