Imprint Apparatus Dechucking Recovery and Realignment
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Solution Overview
Problem
In imprint apparatuses, dechucking occurs when the mold separation force exceeds the holding force, leading to alignment errors and distortion in the pattern formed on the substrate, which hampers continuous imprint processing and productivity, especially in mass production of semiconductor devices.
Innovation Solution
An imprint apparatus equipped with a holding unit, measurement unit, and detection unit that allows for realignment and continued processing after dechucking detection, by re-holding the substrate or mold without unloading it, and measuring its position for precise alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If dechucking detection and re-holding is implemented, then substrate utilization is improved and productivity is enhanced, but alignment precision deteriorates due to position shifts after dechucking
Solution Approach 1:
The patent implements a feedback mechanism where the measurement unit continuously monitors the position of the substrate or mold after dechucking, and the control unit adjusts the holding unit's position based on this feedback to restore accurate alignment. This closed-loop control ensures that alignment precision is maintained even after dechucking events occur, allowing continuous processing without sacrificing manufacturing precision while improving substrate utilization.
2Speed
If the imprint process continues after dechucking without re-measurement, then processing speed is maintained, but pattern accuracy deteriorates due to alignment errors
Solution Approach 1:
The patent performs position measurement and realignment actions immediately after dechucking detection, before the next imprint cycle begins. The measurement unit measures the shifted position and the control unit corrects it in advance, ensuring that subsequent imprint operations are performed with accurate alignment. This preliminary correction prevents pattern accuracy deterioration while minimizing interruption to processing speed.
3Loss of substance
If dechucking is detected and re-holding is performed, then substrate waste is reduced, but process complexity increases due to additional measurement and control steps
Solution Approach 1:
The patent integrates the measurement unit and control functions into the existing imprint apparatus architecture, allowing the same hardware components to serve multiple purposes: normal position monitoring, dechucking detection, and realignment control. This multi-functional design reduces the need for separate dedicated systems, thereby limiting the increase in device complexity while still achieving substrate salvage and continued processing capabilities.
Data Source
AI summary
The present invention provides an imprint apparatus including a holding unit configured to hold a material, a measurement unit configured to measure a position of the material held by the holding unit, a detection unit configured to detect dechucking of the material in the holding unit, and a control unit configured to control continuation processing for continuing an imprint process if the detection unit has detected the dechucking, wherein the control unit performs, as the continuation processing, processing of causing the holding unit to hold the dechucked material again without unloading the material from the imprint apparatus, and processing of measuring, by the measurement unit, a position of the material held again by the holding unit before the imprint process to use the position for alignment in the imprint process.