Imprint Substrate Retention via Intermediary Plate Deformation
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Solution Overview
Problem
The imprint technique faces challenges in accurately forming patterns on small-diameter substrates due to insufficient holding force during mold separation, which can lead to substrate detachment from the substrate stage.
Innovation Solution
The method involves using a plate with a larger dimension than the substrate to support the substrate, and controlling the holding force of the plate by the substrate stage to deform the substrate and plate together into a convex shape during mold separation, ensuring stable substrate retention.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the substrate is deformed into a convex shape during mold separation to reduce pattern distortion, then pattern quality is improved, but the holding force becomes insufficient and the substrate may detach from the substrate stage
Solution Approach 1:
A plate is introduced as an intermediary component between the substrate and the substrate stage. The plate has a larger dimension than the substrate and is held by the substrate stage, while the substrate is supported by the plate. This intermediary structure allows the substrate to be deformed into a convex shape during mold separation without causing detachment, as the plate maintains the holding connection to the substrate stage.
Solution Approach 2:
The solution transitions from directly holding the substrate to holding a plate that supports the substrate. By adding this intermediate dimension of the plate, the system can apply localized deformation to the substrate while maintaining overall stability through the plate's connection to the substrate stage.
2Reliability
If a plate with larger dimension than substrate is used to support the substrate, then substrate retention is improved, but device complexity increases
Solution Approach 1:
The plate serves as a simple intermediary component that bridges the substrate and substrate stage. It provides a stable support surface and maintains holding force without requiring complex mechanisms, thereby improving substrate retention while adding minimal structural complexity.
Data Source
AI summary
The present invention provides an imprint method of forming, using a mold, a pattern of an imprint material on a substrate having a dimension smaller than a dimension of a holding surface of a substrate stage, comprising: causing the holding surface to hold a plate; causing the plate to support the substrate, by causing the holding surface to hold the substrate by via the plate; bringing the mold into contact with the imprint material on the substrate; curing the imprint material on the substrate; and separating the mold from the cured imprint material, wherein holding of the plate by the substrate stage is controlled while maintaining supporting of the substrate by the plate, such that the substrate is deformed into a convex shape together with the plate upon in the separating.