Imprint Device Substrate Stage Path Control
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Solution Overview
Problem
Existing micro-processing technologies, such as inkjet methods, often result in pattern defects due to satellite droplets adhering to patterned regions, which are not effectively addressed by existing airflow solutions that fail to blow away all satellite droplets.
Innovation Solution
An imprint device with a control unit that moves the substrate stage to avoid the discharge port area, preventing satellite droplets from adhering to formed patterns by strategically determining the movement path of the substrate stage during the imprint process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If satellite droplets are blown away using air flow, then pattern defects are reduced, but droplets with sizes not blown by air flow still adhere to the patterned region
Solution Approach 1:
The patent extracts the harmful satellite droplets from the discharge path by moving the substrate stage to avoid the area immediately below the discharge port, where satellite droplets are generated. This spatial separation prevents satellite droplets from adhering to patterned regions regardless of their size.
Solution Approach 2:
The control unit determines the movement path of the substrate stage in advance to avoid the discharge port area, preventing satellite droplet adhesion before it can occur. This preliminary positioning strategy eliminates the need for post-processing cleanup.
2Productivity
If the substrate stage moves through the discharge port area, then the imprint process is efficient, but satellite droplets adhere to formed patterns causing defects
Solution Approach 1:
The patent makes the substrate stage movement dynamic by adjusting its path based on the discharge port position. The control unit dynamically determines the movement path to avoid the discharge port area, balancing efficiency with pattern quality.
Solution Approach 2:
The control unit acts as an intermediary that coordinates between the substrate stage movement and the discharge port position, determining an optimal path that avoids satellite droplet contamination while maintaining process efficiency.
Data Source
AI summary
An imprint device which minimizes the occurrence of pattern defects. The imprint device for forming a pattern made of an imprint material on a shot region formed on a substrate using a mold includes: a supply unit configured to discharge the imprint material through a discharge port and supply the imprint material onto the substrate, a substrate stage configured to hold and move the substrate, and a control unit configured to control the substrate stage. The control unit moves the substrate stage so that a shot region having the pattern formed thereon avoids a portion immediately below the discharge port.