Imprint System Condition Data Transfer for Replica Mold Consistency
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Solution Overview
Problem
Conventional imprint techniques require individual adjustments for imprint processing conditions between replica manufacturing and device manufacturing, due to the reversed concave/convex relationship between master and replica templates, making it difficult to reproduce optimal conditions for replica mold manufacturing.
Innovation Solution
An imprint system comprising a replica manufacturing apparatus, an imprint apparatus, and a management apparatus that communicates to transfer and apply conditions for imprint processing, allowing the replica manufacturing apparatus to form a replica mold and transfer data for the imprint apparatus to replicate the pattern on a substrate using a replica mold, ensuring consistent conditions between replica and device manufacturing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional imprint technique is used with reversed concave/convex relationship between master and replica templates, then replica mold can be manufactured, but individual adjustments are required for imprint processing conditions between replica manufacturing and device manufacturing
Solution Approach 1:
The patent applies the copying principle by creating a replica mold that replicates the master template's pattern. The replica manufacturing apparatus copies the master template's concave/convex structure onto a replica substrate, producing a replica mold that can then be used for device manufacturing. This copying process enables the transfer of pattern formation capabilities while allowing for the management of condition variations between different manufacturing stages.
2Reliability
If individual adjustments are made for imprint processing conditions at replica manufacturing and device manufacturing, then optimal conditions can be achieved for each process, but it becomes difficult to reproduce optimal conditions
Solution Approach 1:
The patent implements feedback by having the replica manufacturing apparatus communicate imprint processing conditions to the device manufacturing apparatus. The management apparatus receives condition data from the replica manufacturing process (such as imprint pressure, temperature, material properties) and transmits this information to the device manufacturing apparatus. This feedback mechanism enables the device manufacturing apparatus to reproduce the same or optimized conditions, ensuring consistency and reliability across different manufacturing stages without requiring manual re-optimization.
3Adaptability or versatility
If data transfer between replica manufacturing apparatus and imprint apparatus is implemented, then imprint processing conditions can be reproduced, but system complexity increases
Solution Approach 1:
The patent applies universality by designing a management apparatus that can handle multiple functions: receiving condition data from the replica manufacturing apparatus, storing and managing this data, and transmitting it to the device manufacturing apparatus. This multi-functional management system creates a universal platform that manages condition data across different apparatus types and manufacturing stages, enabling data compatibility and interoperability without requiring complex custom integration between each specific apparatus pair.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables easy reproduction of imprint processing conditions from replica mold manufacturing to device manufacturing, reducing defects and ensuring consistent pattern formation by optimizing arrangement, contact, irradiation, and mold release conditions, thereby improving the reliability of the imprint process.
Implementation Method 1
an imprint material supplied onto a substrate and a mold in which a pattern is formed are brought into contact with each other, and the imprint material is cured in the contact state
Data Source
AI summary
A replica manufacturing apparatus performs imprint processing of forming a pattern of an imprint material on a replica substrate using a master mold, processes the replica substrate with the formed pattern to manufacture a replica mold, and transfers data of a condition concerning the imprint processing to a management apparatus. An imprint apparatus acquires the data from the management apparatus, and performs the imprint processing of forming a pattern of an imprint material on a substrate using the replica mold.