Imprint System Map Library for Mold Transfer Consistency
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Solution Overview
Problem
In imprint systems, using a mold between different imprint apparatuses can lead to variations in pattern formation due to individual differences between the apparatuses, resulting in defects and reduced productivity when a new map is not generated, as existing methods either cause differences in pattern formation or interrupt the imprint process.
Innovation Solution
An imprint system with a library managing multiple maps for different apparatus and mold combinations, using identification information to select a suitable map for each combination, and generating new maps as needed to maintain consistent pattern formation across apparatuses.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a new map is generated when using the mold in another imprint apparatus, then pattern formation consistency is improved, but productivity decreases due to process interruption
Solution Approach 1:
The system pre-generates and stores multiple maps in advance for different imprint apparatus-mold combinations. When a mold is transferred between apparatuses, the appropriate pre-generated map is selected and applied without interruption to the imprint process, thereby maintaining pattern consistency while avoiding productivity loss from real-time map generation
Solution Approach 2:
Maps are generated beforehand based on predicted differences between imprint apparatuses and stored in a database. This preliminary preparation eliminates the need to interrupt the imprint process for map generation, resolving the contradiction between maintaining pattern consistency and preserving productivity
2Productivity
If the map used by a predetermined imprint apparatus is applied to another imprint apparatus, then productivity is maintained, but pattern formation varies due to individual differences between apparatuses
Solution Approach 1:
The system creates customized maps tailored to each specific imprint apparatus-mold combination, accounting for individual differences in dispenser characteristics, stage positioning, and other apparatus-specific parameters. This localized optimization ensures pattern consistency for each apparatus while maintaining overall productivity through automated map selection
Solution Approach 2:
The system adjusts map parameters based on the specific characteristics of each imprint apparatus and mold combination. By modifying dispensing patterns, timing, and positioning parameters to match the actual conditions of each apparatus, the system maintains pattern formation consistency without requiring process interruptions
Data Source
AI summary
The present invention provides an imprint system which performs an imprint process of forming a pattern of an imprint material on the substrate by using a mold, the system comprising a plurality of processing units each including a dispenser which supplies the imprint material onto the substrate and configured to perform the imprint process, a library configured to manage a plurality of pieces of layout information, and a control unit configured to, when the mold used by a first processing unit is used by a second processing unit, control the second processing unit, based on a difference in condition for the imprint process between the first and second processing units, by using layout information having a difference corresponding to the difference in condition for the imprint process with respect to layout information used by the first processing unit.