Imprint Template Light-Shielding Film Pattern Filling
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Solution Overview
Problem
Imprint lithography methods face defects such as pattern filling due to the uneven curing of resist layers during the imprinting process, where the raised portions of the resist layer can flow and fill the pattern, leading to incomplete or distorted patterns.
Innovation Solution
An imprint method using a light-transmitting template with a pattern surface and a light-shielding portion to control the curing of a photocurable resist layer, where the template is pressed against the resist layer and irradiated with light, allowing only the resist within the light-shielding area to cure, forming a raised portion that maintains the pattern shape and prevents filling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the template is pressed against the resist layer and irradiated with light, then the pattern is transferred to the resist layer, but the raised portions of the resist layer can flow and fill the pattern, leading to incomplete or distorted patterns
Solution Approach 1:
The patent applies preliminary action by forming a cured resist layer around the peripheral edge of the pattern surface before the imprinting process. This pre-formed cured resist layer acts as a barrier that prevents the raised portions of the resist layer from flowing into the pattern area during imprinting, thereby preventing pattern filling while allowing accurate pattern transfer to occur.
2Ease of manufacture
If the entire resist layer is cured uniformly, then the pattern transfer is simplified, but the raised portions cannot be controlled to maintain pattern shape, causing filling defects
Solution Approach 1:
The patent applies local quality by creating a non-uniform curing pattern where the resist layer is cured at different locations and to different extents. Specifically, the resist layer is cured around the peripheral edge of the pattern surface while leaving the central pattern area uncured during the first curing step. This localized curing approach allows the raised portions to maintain their shape and prevents filling, while still enabling complete pattern transfer.
3Manufacturing precision
If the template includes a light-shielding portion, then the curing of the resist layer can be controlled, but the device complexity increases
Solution Approach 1:
The patent applies segmentation by dividing the template into distinct functional regions: a pattern surface with uneven portions for pattern transfer and a light-shielding portion (peripheral wall) surrounding it. This segmentation allows independent control of light exposure in different areas, enabling precise curing control where the peripheral resist is cured while the central pattern area remains uncured during the first curing step.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively prevents pattern filling by controlling the height and shape of the raised portion, ensuring accurate pattern transfer without defects, even when the resist layer flows back, thus maintaining the integrity of the pattern on the substrate.
Implementation Method 1
When the imprint material is irradiated with light, the imprint material in the imprinting region and the imprint material raised at an end edge of the pattern surface adjacent to the imprinting region are exposed, and the imprint material in the imprinting region is cured.
Data Source
AI summary
An imprint method forms a pattern by pressing a template including a pattern surface having an uneven portion against an imprinting region of a photocurable imprint material provided on a substrate. The imprint method includes preparing a template having an adjacent light transmission restricting film on a pattern surface, preparing the substrate including the imprint material, and pressing the pattern surface against the imprint material and irradiating the imprint material with light. In irradiating the imprint material with light, the imprint material in the imprinting region and the imprint material raised at an end edge of the pattern surface adjacent to the imprinting region are exposed, the imprint material in the imprinting region is cured and the imprint material is cured while maintaining a height and a shape of the imprint material that is raised at the adjacent position.