Imprint Lithography Template with Stepped Recession for 3D Memory
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Solution Overview
Problem
The complexity of forming 3D electronic component arrays, such as memory devices, is increased by the need for multiple mask and etch operations, which complicates the process flow and reduces reproducibility in large volume manufacturing, especially when dealing with high-density word lines.
Innovation Solution
A template for imprint lithography is designed with a recession having a distal step with a rounded or tapered sidewall and varying heights, allowing for the accommodation of trapped voids and material shrinkage during the imprinting process, ensuring a robust patterned resist layer is maintained for patterning device layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If multiple mask and etch operations are used to form 3D memory arrays, then the density of electronic components can be increased, but the process flow complexity increases and reproducibility decreases
Solution Approach 1:
The template divides the patterning process into discrete steps through its stepped structure, where each step corresponds to a specific height level. This segmentation allows the complex 3D pattern to be formed through a simplified single-imprint process rather than multiple sequential mask and etch operations, reducing process flow complexity while maintaining high component density
Solution Approach 2:
The template is pre-formed with the complete 3D stepped structure before the imprinting process. This preliminary action of pre-patterning the template allows the complex 3D pattern to be transferred in a single imprinting operation, eliminating the need for multiple sequential mask and etch operations and thereby reducing overall process complexity
2Ease of manufacture
If a template with uniform steps is used, then the manufacturing process is simpler, but trapped voids and material shrinkage cause insufficient thickness in the patterned resist layer
Solution Approach 1:
The template features localized variations in step heights at specific locations, particularly at the distal end where material shrinkage and trapped voids are most likely to occur. This local quality adjustment ensures that the patterned resist layer maintains sufficient thickness in critical areas while keeping the overall template structure simple and manufacturable
Solution Approach 2:
The template incorporates pre-calculated height variations that compensate for expected material shrinkage and trapped voids during the imprinting process. By beforehand cushioning for these defects through increased step heights at critical locations, the patterned resist layer maintains sufficient thickness without requiring complex post-processing
3Productivity
If the distal step has a rounded or tapered sidewall, then material filling is improved, but the template manufacturing precision requirements increase
Solution Approach 1:
The distal step incorporates a rounded or tapered sidewall geometry that facilitates smooth material filling and reduces trapped voids. This curved geometry is applied selectively at the distal end where it is most needed for material flow, while maintaining sharp sidewalls at other locations to minimize overall manufacturing precision requirements
Data Source
AI summary
A template for imprint lithography can include a body. The body can include a base surface and a recession extending from the base surface. The recession can have steps and a feature. The steps can include a distal step that is farther from the base surface as compared to any other step, each step having a corresponding height. The feature can include the distal step includes a rounded or tapered sidewall; a surface along a deepest part of the recession is non-planar; or the height corresponding to the distal step is different from an average height corresponding to remaining steps. The template can be used in an imprint lithography apparatus. The template can be used in manufacturing articles when patterning different layers at the same time. The template is well suited for forming 3D memory arrays.