Imprint Material Viscosity Control at Mold Mesa Edges

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Solution Overview

Problem

In the imprint method for forming patterns on substrates using molds, there is a challenge in preventing the imprint material from protruding and adhering to the lateral surfaces of the mold, which can lead to foreign matter and uneven film thickness, affecting the accuracy and yield of the pattern formation.

Innovation Solution

An imprint apparatus that uses an optical system to apply irradiation light to the peripheral regions of the mold, increasing the viscosity of the imprint material without curing it, and a control unit to manage the timing and intensity of the light application across different zones around the mesa portion of the mold, preventing the material from adhering to the lateral surfaces.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the imprint material is supplied onto the substrate and brought into contact with the mold, then the pattern can be formed on the substrate, but the imprint material may protrude from the mesa portion and adhere to the lateral surface of the mesa portion, causing foreign matters

Engineering Contradiction:
Improvepattern formation accuracyVSAvoidforeign matter generation
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent applies preliminary action by irradiating light to the peripheral region of the mesa portion before the imprint material reaches it. This pre-irradiation increases the viscosity of the imprint material in advance at the peripheral region, creating a barrier that prevents the material from protruding and adhering to the lateral surface of the mesa portion, thus preventing foreign matter generation before it occurs

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent changes the physical parameter (viscosity) of the imprint material by irradiating light to the peripheral region of the mesa portion. This localized parameter change increases viscosity only at the boundary area, allowing the imprint material to be contained within the mesa portion while maintaining proper filling performance in the pattern region

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If light is applied to the outer peripheral portion of the substrate to prevent spreading, then the imprint material does not spread to the outer peripheral portion, but it cannot prevent protrusion over the lateral surface of the mesa portion

Engineering Contradiction:
Improveimprint material containmentVSAvoidlateral surface adhesion prevention
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent applies local quality by selectively irradiating light only to the peripheral region surrounding the mesa portion, not the entire substrate. This creates a localized viscosity increase precisely where needed at the mesa portion boundary, differentiating the properties of the peripheral region from the rest of the imprint material to prevent lateral surface adhesion

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively prevents the imprint material from protruding and adhering to the mold's lateral surfaces, maintaining the filling performance and improving the accuracy and yield of the pattern formation process.

Implementation Method 1

an optical system applying, to a peripheral region, irradiation light acting to increase viscosity of the imprint material

Methodology Applied
Scientific EffectViscosity increase through light irradiation: Photopolymerisation

Data Source

PatentUS12099295B2Imprint apparatuses and article manufacturing methods applying viscosity increases without curing of imprint material
Publication Date: 2024.09.24 CANON KK
  • US12099295B2 patent drawing
  • US12099295B2 patent drawing
  • US12099295B2 patent drawing

AI summary

The present invention provides an imprint apparatus forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including an optical system applying, to a peripheral region, irradiation light acing to increase viscosity of the imprint material, the peripheral region including an end of a mesa portion of the mold and surrounding the mesa portion in a state in which the mesa portion of the mold is held in contact with the imprint material, and a control unit controlling the optical system such that timings of applying the irradiation light to a plurality of zones in the peripheral region are different from each other, the zones being positioned at different distances from a center of the mesa portion, in the state in which the mesa portion of the mold is held in contact with the imprint material on the substrate.