High-aspect-ratio imprinted structure with conformal coating

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Solution Overview

Problem

Existing methods for creating high-aspect-ratio structures are limited by their expense, slowness, and difficulty in achieving rectangular cross-sections, which restricts their transparency, weight, and cost-effectiveness in applications like privacy screens and optical systems.

Innovation Solution

A high-aspect-ratio imprinted structure is formed with a first layer of cured material containing micro-channels, where deposited material is only on the micro-channel walls and the first portion of the bottom, and a filler material is optionally included between the deposited material and the second portion of the bottom, allowing for increased aspect ratio and improved optical and electrical properties.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithographic techniques are used to create small features, then manufacturing precision is improved, but device complexity and cost increase

Engineering Contradiction:

Improvefeature size precisionVSAvoidprocess complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent uses a master template with a desired pattern to imprint micro-channels directly into the polymer layer, copying the pattern without requiring complex photolithographic masks and alignment processes. This simplifies the manufacturing process while maintaining precision.

Inventive Principle:

Principle #26Copying

Solution Approach 2:

The patent replaces the complex chemical photolithographic process with a simpler mechanical imprinting process, where a master template physically imprints the pattern into the polymer layer, eliminating the need for light-sensitive layers, masks, and chemical development processes.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If photolithographic etching is used to create high-aspect-ratio structures, then manufacturing precision is improved, but the aspect ratio is limited and edges become undercut

Engineering Contradiction:

Improvestructure geometryVSAvoidstructure depth

Core Design Contradiction:

Manufacturing precisionVSLength of stationary object

Solution Approach 1:

The patent replaces chemical etching with mechanical imprinting, allowing the formation of high-aspect-ratio micro-channels with vertical walls and rectangular cross-sections. The mechanical imprinting process can achieve depths much greater than the width without the undercutting limitations of photolithographic etching.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If photo-lithographic processes are used, then manufacturing precision is improved, but productivity decreases

Engineering Contradiction:

Improvepattern accuracyVSAvoidmanufacturing speed

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patent replaces the multi-step photolithographic process with a single-step mechanical imprinting process, significantly reducing manufacturing time and increasing productivity while maintaining pattern accuracy through direct copying from the master template.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

4Reliability

If thick layers of light-absorbing material are used in louvered sheets, then privacy performance is improved, but transparency decreases

Engineering Contradiction:

Improveprivacy performanceVSAvoidtransparency

Core Design Contradiction:

ReliabilityVSIllumination intensity

Solution Approach 1:

The patent uses a polymer layer with imprinted micro-channels that can be filled with light-absorbing material. The porous structure allows for high aspect ratio channels with deposited material on the walls, providing privacy performance while maintaining transparency through the optimized channel geometry and material distribution.

Inventive Principle:

Principle #31Porous materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the construction of structures with enhanced transparency, surface quality, and reduced weight and cost, suitable for applications requiring high transparency and optical performance.

Implementation Method 1

deposited material located on the micro-channel walls

Methodology Applied

Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Implementation Method 2

deposited material located on the micro-channel walls

Methodology Applied

Scientific EffectChemical Vapour Deposition: Chemical Vapour Deposition

Implementation Method 3

a first layer of cured layer material having a plurality of micro-channels imprinted in the first layer

Methodology Applied

Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS9519080B2High-aspect-ratio imprinted structure

Publication Date: 2016.12.13 EASTMAN KODAK CO

AI summary

A high-aspect-ratio imprinted structure includes a first layer of cured layer material having a plurality of micro-channels imprinted in the first layer. Each micro-channel has micro-channel walls and a micro-channel bottom, the micro-channel bottom having distinct first and second portions. Deposited material is located on the micro-channel walls and not on the second portion of the micro-channel bottom.