Imprinted Patterned Layer via Basic Compound Neutralization
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Solution Overview
Problem
Substrate Conformal Imprint Lithography (SCIL) faces challenges in achieving reproducible patterned layers due to the retarding effect of acidic sites on the substrate surface, leading to prolonged imprinting times and compromised properties of the resulting patterned layers, especially on substrates like aluminum and chromium.
Innovation Solution
Applying a layer of a compound with basic groups to the substrate surface prior to the polycondensable imprinting composition, which neutralizes acidic sites and facilitates faster polycondensation, thereby reducing imprinting time and improving the predictability of the process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If polycondensable imprinting composition is applied directly to substrate surface, then adhesion is improved, but polycondensation rate is retarded due to acidic sites
Solution Approach 1:
A compound layer comprising basic groups is introduced as an intermediary between the substrate surface and the polycondensable imprinting composition. This intermediate layer neutralizes acidic sites on the substrate surface, preventing them from retarding the polycondensation reaction, while still allowing the imprinting composition to adhere to the substrate through the compound layer.
Solution Approach 2:
The compound layer is applied to the substrate surface before applying the polycondensable imprinting composition. This preliminary action of neutralizing acidic sites prepares the substrate surface in advance, ensuring that when the imprinting composition is applied, the polycondensation reaction can proceed at an optimal rate without being retarded by acidic sites.
2Reliability
If imprinting time is extended to compensate for retarding effect, then patterned layer properties are improved, but productivity decreases
Solution Approach 1:
The basic compound layer acts as a mediator that eliminates the need to extend imprinting time by neutralizing the retarding acidic sites. This allows the polycondensation reaction to proceed at normal speed while still achieving the desired patterned layer properties, thus maintaining high productivity.
Solution Approach 2:
The invention changes the chemical environment at the substrate surface by introducing basic groups that neutralize acidic sites. This parameter change in surface chemistry enables the polycondensation reaction to proceed at optimal rate, achieving both good patterned layer properties and high imprinting throughput.
3Strength
If substrate surface chemistry is directly interacted with polycondensable composition, then adhesion is enhanced, but process predictability is compromised
Solution Approach 1:
The compound layer serves as a standardized intermediary that provides consistent and predictable interaction with the polycondensable imprinting composition. This intermediate layer acts as a buffer that decouples variations in substrate surface chemistry from the polycondensation process, ensuring reproducible and predictable manufacturing outcomes.
Solution Approach 2:
By changing the surface chemistry parameter through the application of a basic compound layer, the invention creates a standardized and controlled interface between the substrate and the imprinting composition. This parameter change enhances process predictability by eliminating the variability introduced by different substrate surface chemistries.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the formation of patterned layers with improved adhesion and properties, such as faster curing and enhanced stability, by decoupling the substrate's surface chemistry from the polycondensation process, thus enabling shorter imprinting times and higher throughput.
Implementation Method 1
a layer of a compound having basic groups is applied to the substrate surface prior to the polycondensable imprinting composition, which neutralizes acidic sites
Implementation Method 2
the compound comprises at least one condensable group reactive with surface groups of the surface by condensation reaction
Implementation Method 3
polycondensation of the imprinting composition taking place during the imprinting thereby to form the patterned layer
Data Source
AI summary
Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.