Imprinting Profile Adjustment via Curvature Simulation
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Solution Overview
Problem
Current imprinting techniques require significant time and cost to adjust the imprinting profile for an imprinting device due to the need for trial and error in adjusting external conditions, leading to potential poor patterns and inefficient defect detection.
Innovation Solution
An information processing device that simulates imprinting and adjusts the imprinting profile by acquiring curvature changes of the pattern part using a spread camera and adjusting the profile to prevent curvature from falling below a predetermined threshold, thereby optimizing the imprinting process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If trial and error method is used to adjust imprinting profile, then imprinting conditions can be optimized, but enormous amount of time and cost are required
Solution Approach 1:
The patent applies preliminary action by pre-calculating and storing optimal imprinting profiles in a database before actual imprinting operations. The system predicts appropriate imprinting conditions based on external environment parameters (temperature, humidity, substrate properties) and stores these pre-optimized profiles. When imprinting is needed, the system retrieves the pre-calculated profile matching the current environment conditions, eliminating the need for time-consuming trial and error adjustments during production.
Solution Approach 2:
The patent uses copying by creating a database of pre-optimized imprinting profiles that replicate optimal conditions for various external environments. Instead of performing actual trial and error experiments each time, the system copies the most suitable pre-established profile from the database based on measured environmental parameters, thereby rapidly reproducing optimal imprinting conditions without repeated experimentation.
2Measurement precision
If direct observation method with defect inspection device is used to detect poor pattern, then poor pattern can be identified, but it takes time to find poor pattern each time of imprinting
Solution Approach 1:
The patent implements feedback by using a curvature measurement device to monitor the curvature of the mold during imprinting in real-time. The system compares the measured curvature against predetermined threshold values and provides immediate feedback about potential poor pattern formation. This allows the system to detect issues during the imprinting process itself rather than requiring time-consuming post-imprinting inspection, enabling real-time quality control without reducing productivity.
3Manufacturing precision
If imprinting profile is not appropriately adjusted, then bubbles entrained during imprinting may cause poor pattern, but adjusting profile requires trial and error
Solution Approach 1:
The patent uses copying by creating a database of pre-optimized imprinting profiles that replicate optimal conditions for various external environments. Instead of performing actual trial and error experiments each time, the system copies the most suitable pre-established profile from the database based on measured environmental parameters, thereby rapidly reproducing optimal imprinting conditions without repeated experimentation.
Solution Approach 2:
The patent applies parameter changes by systematically varying imprinting parameters (imprinting force, cavity pressure, imprinting speed) in pre-calculated profiles based on external environment conditions. The database stores optimized parameter combinations for different temperature, humidity, and substrate conditions, allowing the system to select the appropriate parameter set without complex trial and error adjustments during operation.
Data Source
AI summary
To provide an information processing device, or the like that can reduce cost and time required for adjusting a profile of imprinting of an imprinting device, the information processing device for performing simulation of the imprinting with the imprinting device includes a curvature acquisition unit that acquires a change of a curvature of a pattern part in a vicinity of an outer circumference of a contact surface when the pattern part is brought in contact with an imprinting material in the imprinting, and a profile adjustment unit that adjusts a profile of the imprinting of the pattern part such that the curvature does not fall below a predetermined threshold.