Impurity Processing Device Electrostatic Metal Removal

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Solution Overview

Problem

Conventional methods for removing metal impurities from solid-liquid mixtures used in electronic devices, such as lithium-ion batteries, are inadequate, particularly for nonmagnetic metals, leading to insufficient treatment rates and potential short circuits due to unresolved impurities.

Innovation Solution

An impurity processing device and method involving a pipe with insulated first and second electrodes through which a treated liquid containing metal impurities flows, with a power supply generating a current to ionize and miniaturize the impurities, allowing for their removal or deposition on the electrodes, effectively treating both magnetic and nonmagnetic metals.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If magnetic removal method is used, then magnetic metal impurities can be removed, but nonmagnetic metal impurities cannot be removed

Engineering Contradiction:
Improveimpurity removal effectivenessVSAvoid适用范围
Core Design Contradiction:
ReliabilityVSAdaptability or versatility

Solution Approach 1:

The patent changes the physical principle from magnetic field interaction to electrical field interaction by applying voltage between electrodes. This parameter change enables the removal of both magnetic and nonmagnetic metal impurities through electrostatic attraction, expanding the适用范围 while maintaining effective impurity removal.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If conventional magnetic removal method is used, then the process is simple, but the treatment rate of impurities is insufficient

Engineering Contradiction:
Improvetreatment rateVSAvoiddevice structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent replaces the mechanical magnetic separation process with an electrical field-based electrostatic removal system. By substituting the mechanical magnetic attraction mechanism with electrical field forces between electrodes, the treatment rate increases significantly while the device structure remains relatively simple.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If metal impurities remain in the treated liquid, then the liquid can be used, but short circuits may occur in electronic devices

Engineering Contradiction:
Improvecontinuous processingVSAvoidshort circuit risk
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent extracts metal impurities from the treated liquid by attracting them to oppositely charged electrodes through electrostatic forces. This extraction process removes harmful metal particles that could cause short circuits, allowing the treated liquid to be safely used in electronic device manufacturing while maintaining continuous processing capability.

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution significantly increases the treatment rate of metal impurities by miniaturizing them, preventing short circuits and enhancing the performance of electronic devices by ensuring the impurities are removed or dispersed, even if they remain in the treated liquid, thus improving the reliability of electronic storage devices.

Implementation Method 1

causing a current to flow between the first electrode and the second electrode

Methodology Applied
Scientific EffectIonization: Ionisation

Implementation Method 2

causing a current to flow to the treated liquid flowing through the pipe

Methodology Applied
Scientific EffectElectrodeposition: Electrodeposition

Data Source

PatentUS20230102372A1Impurity processing device and impurity processing method
Publication Date: 2023.03.30 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
  • US20230102372A1 patent drawing
  • US20230102372A1 patent drawing
  • US20230102372A1 patent drawing

AI summary

An impurity processing device includes: a pipe through which a treated liquid containing metal impurities flows; a first electrode and a second electrode disposed in the pipe; and a power supply causing a current to flow between the first electrode and the second electrode.