Low-Profile In-Chamber Sensor Array for Pressure Distribution Mapping
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Solution Overview
Problem
Conventional methods for measuring chamber pressure in processing systems, such as chemical vapor deposition, do not accurately reflect local pressure variations across the substrate surface, leading to non-uniform processing and increased yield loss in semiconductor wafers.
Innovation Solution
In-chamber low-profile sensor assemblies with pressure and flow sensors disposed across the substrate surface provide localized measurements, allowing for precise determination of pressure and flow distributions within the processing chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single pressure gauge is used to measure chamber pressure, then the device complexity is low, but the measurement precision of local pressure variations is insufficient
Solution Approach 1:
The chamber pressure measurement is segmented into multiple discrete measurement points across the substrate surface. Instead of using a single pressure gauge, the patent employs an array of pressure sensors distributed at different locations to capture local pressure variations, thereby achieving comprehensive pressure distribution mapping with improved measurement precision.
Solution Approach 2:
The measurement approach transitions from a single-point measurement to a multi-dimensional pressure distribution measurement. By arranging pressure sensors in a two-dimensional array across the substrate surface, the system captures pressure variations in both spatial dimensions, enabling comprehensive analysis of pressure distribution patterns that cannot be obtained with conventional single-point measurement.
2Measurement precision
If multiple sensors are deployed across the substrate surface, then the measurement precision of pressure distribution is improved, but the device complexity increases
Solution Approach 1:
The sensor assembly is designed to perform multiple functions simultaneously: pressure measurement, flow measurement, and spatial mapping. Each sensor element in the array is multi-functional, capable of detecting both pressure and flow parameters, which reduces the overall system complexity by eliminating the need for separate measurement systems for different parameters.
Solution Approach 2:
Multiple measurement functions are merged into a single integrated sensor assembly. The pressure sensors and flow sensors are combined in a unified array structure, sharing common support infrastructure, data acquisition systems, and processing electronics, thereby reducing device complexity despite the increased number of sensing elements.
3Productivity
If continuous sensor activation is used, then the productivity of monitoring is high, but the use of energy increases
Solution Approach 1:
The sensor activation follows a periodic pattern based on process conditions. Sensors are activated only during critical process phases or when specific triggers are detected, rather than operating continuously. This periodic activation maintains high monitoring productivity for critical events while significantly reducing overall energy consumption during non-critical periods.
Solution Approach 2:
The sensor activation state is dynamic rather than static. The system adaptively adjusts sensor activation based on real-time process conditions, activating sensors only when environmental conditions warrant monitoring. This dynamic approach optimizes the balance between monitoring productivity and energy consumption by matching sensor activity to actual process needs.
Data Source
AI summary
A sensor system includes a processing chamber and a sensor assembly disposed within the processing chamber. The sensor assembly includes a substrate and a plurality of sensors including at least one of pressure sensors or flow sensors disposed across a surface of the substrate. Each respective sensor is adapted to measure a respective pressure or a respective flow of an environment proximate the respective sensor. The sensor system further includes a processing device communicatively coupled to the sensor assembly. The processing device is adapted to receive at least one of the measured respective pressures or the measured respective flows and determine a pressure distribution or a flow distribution of the processing chamber.