In-Plane Printing Composition for Maskless Pattern Formation
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Solution Overview
Problem
The photolithographic method for forming fine patterns on substrates is costly and time-consuming due to the need for expensive photo masks and repetitive masking steps.
Innovation Solution
A composition comprising a liquid prepolymer, acrylate with a hydrophilic group, viscosity modifier, photoinitiator, and additive is used to form a resist pattern on a substrate without a photo mask, employing a mold for pattern formation and subsequent etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithographic method is used to form fine patterns, then pattern formation capability is achieved, but production cost increases and manufacturing time extends
Solution Approach 1:
The patent extracts and eliminates the photo mask component from the photolithographic process, replacing it with a direct printing method that uses a composition applied to the substrate. This removes the need for mask fabrication, alignment, and repeated masking steps, thereby reducing manufacturing time while maintaining pattern formation capability.
Solution Approach 2:
The patent employs a printing method that directly copies the desired pattern onto the substrate using a composition, eliminating the need for physical photo masks. This copying approach allows for direct pattern transfer without the time-consuming mask preparation and alignment procedures of traditional photolithography.
2Manufacturing precision
If photolithographic method is used to form fine patterns, then pattern formation capability is achieved, but production cost increases
Solution Approach 1:
The patent extracts and eliminates the expensive photo mask component from the photolithographic process, replacing it with a direct printing method. This removes the need for mask fabrication and repeated masking steps, thereby reducing production costs while maintaining pattern formation capability.
Solution Approach 2:
The patent replaces expensive, reusable photo masks with a disposable or single-use printing composition that is applied directly to the substrate. This eliminates the high cost of mask fabrication and handling, making the process more cost-effective despite the composition being consumed in the process.
3Device complexity
If mold is used for in-plane printing, then pattern formation is simplified, but mold stress and transformation occur during separation
Solution Approach 1:
The patent modifies the physical and chemical parameters of the composition, including its viscosity, elasticity, and curing characteristics, to enable it to withstand mold separation stress. By controlling these parameters, the composition maintains pattern integrity while reducing stress on the mold during the separation process.
Solution Approach 2:
The patent uses a composite composition comprising multiple components (prepolymer, acrylate, viscosity modifier, photoinitiator, and additive) that work together to provide both pattern-forming capability and mechanical resilience during mold separation. The synergistic combination of these materials reduces stress and transformation during the separation process.
4Manufacturing precision
If high-resolution pattern formation is achieved, then manufacturing precision improves, but process complexity increases
Solution Approach 1:
The patent extracts and eliminates the complex photolithographic apparatus (photo mask, exposure system, alignment mechanisms) and replaces it with a simpler direct printing process. This simplification maintains high-resolution pattern formation capability while reducing overall process complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces production costs, simplifies the fabrication process, and achieves high-resolution thin film patterns with minimized mold separation stress, resulting in an excellent pattern profile and extended mold lifetime.
Implementation Method 1
a composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer; about 40% to about 60% by weight of an acrylate having a hydrophilic group; about 10% to about 20% by weight of a viscosity modifier; about 1% to about 5% by weight of a photoinitiator; and an additive
Data Source
AI summary
A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.