Inclined Liquid Port Nozzle for Substrate Cleaning

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Solution Overview

Problem

Conventional substrate cleaning apparatuses are inefficient in cleaning the peripheral areas of substrates, particularly when the cleaning liquid is ejected towards the center of the lower surface, leading to incomplete cleaning and liquid scattering during rotation.

Innovation Solution

A liquid treatment apparatus with a bar-shaped nozzle that ejects treatment fluids, featuring a plurality of liquid-ejecting ports arrayed on a horizontal line extending inwardly from the peripheral portion of the substrate, inclined at an angle to the rotating direction, allowing for efficient cleaning of the lower substrate surface by preventing liquid scattering and ensuring uniform coverage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If cleaning liquid is ejected towards the center of the lower substrate surface, then the central area can be cleaned, but the peripheral area cannot be sufficiently cleaned

Engineering Contradiction:

Improvecleaning uniformityVSAvoidperipheral cleaning coverage

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

The nozzle is divided into multiple liquid-ejecting ports arranged along the horizontal line, with each port independently ejecting liquid at a specific inclination angle. This segmentation allows different regions of the substrate to receive targeted liquid application, ensuring both central and peripheral areas are adequately cleaned.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Each liquid-ejecting port is configured with a specific inclination angle relative to the substrate rotation direction, creating localized optimal cleaning conditions. The inclination angle varies by position to match the rotational dynamics, ensuring uniform cleaning quality across different regions of the substrate surface.

Inventive Principle:

Principle #3Local quality

2Device complexity

If cleaning liquid is ejected vertically onto the rotating substrate, then liquid application is simple, but liquid scattering occurs reducing cleaning efficiency

Engineering Contradiction:

Improvenozzle configuration simplicityVSAvoidcleaning efficiency

Core Design Contradiction:

Device complexityVSProductivity

Solution Approach 1:

The liquid ejection parameters are changed by introducing an inclination angle relative to the substrate rotation direction. This angular parameter adjustment prevents liquid scattering caused by substrate rotation, maintaining cleaning efficiency without complicating the nozzle configuration.

Inventive Principle:

Principle #35Parameter changes

3Area of stationary object

If a two-fluid nozzle is used to jet spray towards the upper surface, then cleaning coverage is improved, but the lower surface cleaning is not addressed

Engineering Contradiction:

Improvecleaning coverage areaVSAvoiddual surface treatment capability

Core Design Contradiction:

Area of stationary objectVSAdaptability or versatility

Solution Approach 1:

Instead of ejecting liquid towards the upper substrate surface as in conventional two-fluid nozzles, this invention inverts the approach by ejecting liquid towards the lower substrate surface. The liquid-ejecting ports are positioned and angled to target the lower surface, enabling effective lower surface cleaning while maintaining the benefits of two-fluid spray technology.

Inventive Principle:

Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively prevents liquid scattering and ensures high in-plane uniformity of the treatment, improving the cleaning efficiency and throughput by using a combination of liquid and gas jets to clean both the upper and lower surfaces of substrates.

Implementation Method 1

each of the first liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate

Methodology Applied

Scientific EffectInclined ejection:

Implementation Method 2

Methodology Applied

Scientific EffectLiquid-gas jet:

Data Source

PatentUS9022045B2Substrate liquid cleaning apparatus with controlled liquid port ejection angle

Publication Date: 2015.05.05 TOKYO ELECTRON LTD

AI summary

Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.