Inclined Precursor Container for ALD Dosing Speed
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Solution Overview
Problem
In atomic layer deposition, controlling the dose of liquid precursors is challenging due to elevated temperatures affecting vapor pressure, leading to slow and difficult dosing, especially with small containers.
Innovation Solution
A precursor source arrangement that inclines liquid precursor containers to increase surface area, combined with a heating element for efficient vaporization and temperature control, allowing for faster and more precise dosing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the liquid precursor container is kept at low temperature to maintain controlled vaporization, then the vapor pressure remains stable and dosing precision is improved, but the dosing speed becomes slow due to low vapour pressure
Solution Approach 1:
The patent changes the spatial orientation of the liquid precursor container from vertical to inclined position. This dimensional change increases the liquid surface area exposed to the vaporization zone, allowing more liquid to evaporate simultaneously. The inclined container creates a larger effective vaporization surface without requiring higher temperatures, thus improving dosing speed while maintaining dosing precision through controlled temperature.
2Stability of the object's composition
If the liquid precursor container is cooled to maintain desired temperature, then temperature stability is improved, but the surrounding elevated temperatures make temperature control difficult and complex
Solution Approach 1:
The patent employs a heating element that directly heats the inclined container, allowing the system to actively maintain desired temperature rather than passively relying on cooling. This self-heating capability enables the precursor container to compensate for environmental heat influence, achieving temperature stability without complex cooling systems. The inclined position combined with direct heating creates an efficient temperature control mechanism that simplifies the overall system.
3Volume of moving object
If small liquid precursor containers are used, then space efficiency is improved, but dosing becomes increasingly slow and difficult to control due to substantially low vapour pressure
Solution Approach 1:
By inclining small precursor containers, the patent maximizes the liquid surface area within the limited container volume. This dimensional adjustment allows small containers to achieve effective vaporization rates comparable to or exceeding larger vertical containers. The inclined position ensures that the liquid spreads out, creating a larger evaporative surface area that compensates for the small container size, thereby maintaining fast dosing speed while preserving space efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This arrangement enhances the speed and control of precursor vaporization, improving the dosing process and maintaining stability of the liquid surface, thereby addressing the limitations of prior art.
Implementation Method 1
The size of the dose is dependent on vapour pressure of the liquid precursor in the liquid precursor container. The vapour pressure further is dependent on temperature of the precursor.
Implementation Method 2
Vaporization of liquid precursor is dependent on the surface area of the liquid material and the temperature of the liquid material.
Data Source
AI summary
A precursor source arrangement for an atomic layer deposition apparatus for receiving a liquid precursor container for liquid precursor. The precursor source arrangement includes a precursor container support arrangement arranged to hold the liquid precursor container in inclined position relative to vertical direction.