Inclined Liquid Receiving Region for Substrate Processing Efficiency
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Solution Overview
Problem
Conventional liquid processing methods for substrates require excessive amounts of processing liquid and are inefficient, leading to increased manufacturing costs and prolonged processing times.
Innovation Solution
A liquid processing apparatus and method that utilizes a nozzle with a discharge port extending continuously in one direction or intermittently arranged discharge ports, moving in a straight line with a liquid receiving region inclined relative to the substrate's rotation axis, ensuring efficient distribution and reduction of processing liquid usage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the nozzle moves in a straight line with the liquid receiving region extending in an inclined direction, then the processing liquid spreads quickly over a wide range and uniform film formation is achieved in shorter time, but the device complexity increases due to the inclined liquid receiving region configuration
Solution Approach 1:
The liquid receiving region is configured to extend in a direction inclined at an angle θ (0° < θ ≤ 45°) relative to the straight line direction of nozzle movement. This inclination introduces a dimensional component that leverages substrate rotation to propel the processing liquid downstream, enabling faster and more uniform spread across the substrate surface without increasing nozzle movement complexity.
Solution Approach 2:
The system utilizes the dynamic rotation of the substrate to enhance liquid distribution. The processing liquid is discharged onto the rotating substrate, and the rotation itself provides the driving force for the liquid to spread downstream toward the second end of the liquid receiving region, reducing the need for complex pumping or pressurization systems.
2Manufacturing precision
If the processing liquid is supplied to the entire substrate, then complete coverage is achieved, but the amount of processing liquid required increases manufacturing cost
Solution Approach 1:
The liquid receiving region is designed with a specific inclined geometry where the second end is located farther downstream than the first end. This creates a localized flow path that directs the processing liquid efficiently across the substrate surface, ensuring complete coverage while minimizing the total volume of liquid required through optimized flow distribution.
Solution Approach 2:
By inclining the liquid receiving region at an angle θ relative to the nozzle movement direction, the system utilizes the substrate's rotation to propel liquid downstream, creating a sweeping coverage pattern that achieves complete substrate coverage with reduced liquid consumption compared to perpendicular or radial discharge patterns.
3Ease of operation
If the processing liquid is discharged perpendicular to the substrate surface, then direct contact is achieved, but the liquid does not spread efficiently across the substrate
Solution Approach 1:
Instead of discharging liquid purely perpendicular to the substrate, the liquid receiving region is inclined at an angle θ (0° < θ ≤ 45°) relative to the nozzle movement direction. This creates a downstream component in the liquid discharge path that, combined with substrate rotation, propels the liquid efficiently across the substrate surface toward the second end of the liquid receiving region, significantly improving spread efficiency.
Solution Approach 2:
The liquid receiving region is configured asymmetrically with respect to the nozzle movement direction, with the second end positioned farther downstream than the first end. This asymmetric configuration creates a preferential flow direction that enhances liquid spread efficiency by utilizing the substrate's rotation to drive liquid toward the downstream region.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for uniform film formation on the substrate in a shorter time, reducing the amount of processing liquid required and enhancing processing efficiency.
Implementation Method 1
a liquid receiving region that receives the processing liquid on the upper surface of the substrate extending in a direction inclined with respect to the straight line... the second end is located farther downstream than the first end in a rotation direction of the substrate
Data Source
AI summary
A development liquid is discharged from a development liquid nozzle having one discharge port extending continuously in one direction to the substrate. The development liquid nozzle is fixed such that the development liquid is supplied to a reference straight line on an upper surface of the substrate, and is fixed such that a liquid receiving region that receives the development liquid on the upper surface of the substrate extends in a direction inclined with respect to the reference straight line, the reference straight line passing through a rotational center of the substrate. The development liquid nozzle is moved in a direction of the reference straight line. The liquid receiving region has one end and another end. The other end is located farther away from the rotational center of the substrate than the one end, and is located farther downstream in the rotation direction of the substrate than the one end.