Inclined Rotating Substrate Tray for Particle Coating
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Solution Overview
Problem
Existing coating methods using cathode sputtering face challenges such as substrate sticking and low coating rates, particularly with sensitive and small particles, and are limited by high gas flows and mechanical stress from vibration.
Innovation Solution
A device with an inclined, rotatable substrate tray that experiences intermittent contact with a side wall, promoting movement and vibration through gravity and impact, reducing sticking and enhancing mixing while being compatible with low gas pressures and sensitive substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If vibration is applied to mix substrate particles, then mixing is improved, but compaction occurs leading to increased sticking
Solution Approach 1:
The patent applies mechanical vibrations through the inclined plate rotation and intermittent contact with the fixed side wall, which generates shaking movements that mix substrate particles without the continuous vibration that causes compaction. The vibrations are transient and directional, promoting particle redistribution while maintaining loose packing.
Solution Approach 2:
The inclined plate rotates periodically, creating intermittent contact between the substrate tray and the fixed side wall. This periodic action generates repeated shock and vibration cycles that mix particles effectively without sustained vibration that would lead to compaction and sticking.
2Manufacturing precision
If high gas flows are used in vortex coating, then coating uniformity is improved, but the method is limited in applicability
Solution Approach 1:
The patent replaces the gas-flow-dependent vortex coating mechanism with a mechanically-driven inclined plate rotation system. The substrate tray is moved and mixed through mechanical rotation and impact against the fixed side wall, eliminating the need for high gas flows while achieving uniform coating distribution.
3Measurement precision
If substrate tray is tightly fixed in the inclined plate, then positioning is improved, but movement and mixing are reduced
Solution Approach 1:
The substrate tray is designed with a loose fit in the inclined plate, allowing it to move dynamically during rotation. The tray can shift position and rotate relative to the plate, creating variable motion patterns that enhance substrate mixing while the inclined plate geometry maintains overall positioning control.
Solution Approach 2:
The system separates the functions of positioning (performed by the inclined plate geometry and rotation mechanism) from mixing (performed by the loose tray movement and impact against the fixed side wall). This segmentation allows both positioning accuracy and mixing effectiveness to be optimized independently.
4Productivity
If rotation speed is increased to improve coating rate, then productivity is improved, but mechanical stress on sensitive particles increases
Solution Approach 1:
The patent optimizes the rotation speed parameter of the inclined plate to achieve an optimal balance between coating rate and particle stress. The intermittent contact mechanism with the fixed side wall provides effective mixing and coating at moderate rotation speeds, avoiding the high mechanical stresses that would occur at higher speeds while maintaining productive coating rates.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device achieves improved coating uniformity and reduced substrate sticking, maintaining mechanical stability and efficiency in the micrometer range, allowing for effective detachment and uniform coating of various substrates without compaction.
Implementation Method 1
When the plate rotates, due to the inclined position, gravity forces the substrate tray to move in and relative to the plate
Implementation Method 2
vibrations always occur when the substrate tray hits the side wall of the plate during this movement
Implementation Method 3
The device is based on magnetron sputtering technology, which is known per se, whereby in addition to the electric field (obvious in cathode sputtering), a magnetic field is arranged in such a way that the charge carriers circulate in spiral paths over the target surface
Data Source
Figure 1
Figure 2~3
Figure 4A~4E
AI summary
A device (1) for coating a substrate made of particles by means of cathode atomisation with a movable substrate dish (4) tilted relative to the horizontal plane, wherein the substrate dish (4) is arranged loose in a plate (3) which is rotatable about an axis of rotation (10), is tilted and has a side wall (8), wherein an outer wall (19) of the substrate dish (4) is intermittently in contact with the inner side (17) of the side wall (8) of the plate (3).