Indexer Hub Flow Redirection for Multi-Station Chamber Cleaning
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Solution Overview
Problem
Existing multi-station semiconductor processing chambers face challenges in effectively cleaning accumulated unwanted materials and contaminants from internal features due to complex geometries and blocked access areas, leading to reduced throughput and increased particle contamination.
Innovation Solution
A method involving a cleaning chemistry inlet that directs cleaning chemistry onto a hub with channels, which is rotated to multiple angular positions, allowing the chemistry to flow into various regions of the chamber, and a hub positioning mechanism that adjusts vertical and angular positions to ensure thorough cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If cleaning chemistry is applied to the processing chamber, then contamination is reduced, but cleaning time increases and throughput decreases
Solution Approach 1:
The cleaning process is segmented into multiple discrete steps including raising the hub, rotating to different angular positions, and applying cleaning chemistry to different regions sequentially. This segmentation allows for targeted cleaning of specific areas (substrate support structures, sidewalls, chamber walls) without requiring complete chamber shutdown, thereby maintaining throughput while ensuring thorough cleaning where needed.
Solution Approach 2:
The hub is made dynamically movable between different vertical positions and rotational angles during the cleaning process. By raising the hub vertically and rotating it to different angular positions, the cleaning chemistry delivery system can dynamically access different regions of the chamber interior, enabling comprehensive cleaning without extending total processing time significantly.
2Ease of operation
If the hub is raised to a higher vertical position, then access to upper chamber regions is improved, but structural stability and alignment precision may be compromised
Solution Approach 1:
The system incorporates feedback mechanisms through sensors that detect the hub's vertical position and angular orientation. This feedback allows the control system to make real-time adjustments to maintain precise alignment and positioning even as the hub moves between different vertical levels and rotational angles, ensuring that cleaning chemistry is delivered accurately to intended targets throughout the chamber.
Solution Approach 2:
The hub positioning system changes multiple parameters simultaneously - vertical position (height), rotational angle, and potentially radial position - in a coordinated manner. By controlling these parameters in combination rather than independently, the system achieves both improved accessibility to various chamber regions and maintains the precision required for effective cleaning delivery.
3Reliability
If the hub is rotated to multiple angular positions, then coverage of chamber regions is improved, but mechanical wear and positioning time increase
Solution Approach 1:
The hub rotation follows a periodic pattern, rotating to predetermined angular positions (such as 0°, 90°, 180°, 270°) where cleaning chemistry is applied, then returning to a home position. This periodic action ensures comprehensive coverage of all chamber regions over time while minimizing total rotation time by only visiting necessary positions rather than continuously rotating.
Solution Approach 2:
The system performs preliminary positioning of the hub to optimal angular positions before applying cleaning chemistry. By pre-positioning the hub at angles that provide maximum cleaning coverage for upcoming processing steps, the system reduces the need for frequent repositioning during actual cleaning operations, thereby minimizing positioning time while maintaining thorough coverage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances cleaning efficiency by directing cleaning chemistry to previously inaccessible areas, reducing particle contamination, and maintaining high throughput by effectively removing residues from chamber surfaces.
Implementation Method 1
a hub located in a center area of the chamber interior, configured to rotate about a center axis
Implementation Method 2
having a plurality of channels in a top surface of the hub... causing the cleaning chemistry to flow through at least some channels in the plurality of channels and into a plurality of first regions within the chamber interior
Data Source
AI summary
Systems and methods for redirecting cleaning chemistry flows within a multi-station semiconductor processing chamber are disclosed. In such systems, a cleaning chemistry flow, e.g., a plasma from a remote plasma generator, may be directed onto a hub of an indexer that is centrally mounted within the chamber. The hub may have features that cause the cleaning chemistry flows to be redirected in a radially outward direction. By rotating the hub and/or changing the relative elevational positions between the hub and a cleaning chemistry inlet that provides the cleaning chemistry, the cleaning chemistry may be redirected into different regions of the chamber, thereby allowing for a more thorough and complete cleaning process.