Inductive Coupling Antenna Unit for Direct Substrate Surface Heating

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Solution Overview

Problem

Conventional plasma treatment apparatuses require longer times to heat a substrate's surface to the desired temperature range due to indirect heating methods, which hinder efficient plasma film formation.

Innovation Solution

An inductive coupling antenna unit is airtightly mounted in a vacuum chamber with a heating heater positioned on the antenna conductor side of the substrate, allowing direct heating and rapid temperature control, and is configured with a plasma shield plate to prevent contamination and easy maintenance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If heating is performed from the back side of the substrate using a heating heater, then the substrate can be heated, but the heating time is excessively long and the temperature responsiveness is poor

Engineering Contradiction:
Improvesubstrate surface temperatureVSAvoidheating time
Core Design Contradiction:
TemperatureVSLoss of time

Solution Approach 1:

The patent inverts the conventional heating approach by positioning the heating heater on the antenna conductor side (front side) rather than the back side of the substrate. This allows direct heating of the treated surface, dramatically reducing heating time and improving temperature responsiveness while maintaining the required temperature range for plasma treatment.

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The patent introduces a plasma shield plate as an intermediary component that separates the plasma generation area from the heating area. This shield plate allows the heating heater to be positioned close to the substrate for efficient direct heating while preventing plasma contamination of the heater, thus resolving the contradiction between heating efficiency and heater protection.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If the heating heater is positioned close to the substrate for direct heating, then heating efficiency improves, but the heater becomes contaminated by plasma

Engineering Contradiction:
Improveheating efficiencyVSAvoidheater contamination by plasma
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The plasma shield plate serves as a protective intermediary between the plasma generation area and the heating heater. It allows thermal energy to pass through to the substrate while blocking plasma particles from contaminating the heater, enabling the heater to be positioned close to the substrate for efficient direct heating without suffering from plasma contamination.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent segments the vacuum chamber into distinct functional areas using the plasma shield plate - a plasma generation area and a heating area. This spatial segmentation allows each component to operate in its optimal environment without interference, enabling the heater to function efficiently without plasma contamination.

Inventive Principle:
Principle #1Segmentation

3Temperature

If indirect heating from the back side is used, then the substrate can be heated, but the treated surface cannot be directly heated resulting in poor temperature control

Engineering Contradiction:
Improvesubstrate surface temperatureVSAvoidtemperature control responsiveness
Core Design Contradiction:
TemperatureVSEase of operation

Solution Approach 1:

The patent inverts the heating configuration to enable direct heating of the treated surface from the front side. This inversion allows the heating heater to directly heat the substrate surface that requires temperature control, significantly improving temperature responsiveness and ease of maintaining the desired temperature range during plasma treatment.

Inventive Principle:
Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables quick and efficient heating of the substrate surface to the desired temperature range, facilitating better plasma treatment responsiveness and uniformity, while preventing heater contamination and simplifying maintenance.

Implementation Method 1

high frequency power is supplied to an antenna to generate plasma

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 2

a heating heater is provided on the back side of the treated surface of the substrate so that heating can be performed

Methodology Applied
Scientific EffectThermal radiation: Thermal Radiation

Data Source

PatentEP4394842A1Inductive coupling antenna unit and plasma treatment apparatus
Publication Date: 2024.07.03 PLASMA ION ASSIST
  • EP4394842A1 patent drawingFigure 1
  • EP4394842A1 patent drawingFigure 2-1
  • EP4394842A1 patent drawingFigure 2-2

AI summary

An inductive coupling antenna unit is airtightly mounted in an opening provided in a wall of a vacuum chamber. The inductive coupling antenna unit includes: a lid, airtightly covering the opening; an antenna conductor, provided on the lid; and a heating heater, provided on an inner surface of the lid.