Inductive Plasma Deposition Antenna Tilting for Substrate Protection

The method applies preliminary action by first generating plasma at low output power to establish a stable plasma state before the substrate arrives, then maintaining this plasma state at low power during substrate processing. This prevents substrate damage while ensuring plasma is already formed and stable, eliminating the need to apply high power during substrate exposure.

The patent uses an intermediary approach by introducing a specific gas mixture composition that facilitates easy plasma ignition at low power. The gas composition acts as a mediator that enables plasma generation without requiring high output power, thereby preventing substrate damage while maintaining plasma generation efficiency.

The method employs periodic action by cyclically alternating between plasma generation phases and non-plasma phases. Plasma is generated at low power periodically, allowing the plasma state to stabilize between cycles. This periodic approach maintains overall deposition efficiency while ensuring plasma stability during active processing periods.

The system performs preliminary plasma generation before substrate processing begins, establishing a stable plasma state in advance. This preliminary action ensures that when deposition actually starts, the plasma is already stable and ready, improving both deposition efficiency and plasma stability without requiring continuous high-power plasma generation.