Inductively Coupled Plasma Chamber With Two-Sided Optical Access
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Solution Overview
Problem
Existing Z-pinch plasma chambers face challenges in generating high power and high brightness EUV light while maintaining stability and reliability, as they often require electrodes that can melt and produce debris, and lack backside access due to the high voltage region obscuring the Z-pinch region.
Innovation Solution
The design employs an electrodeless approach with inductive coupling of current into the plasma, using a plasma chamber with a high voltage region, a grounded region, and an insulating region to reduce ion attraction and allow two-sided optical access, enabling flexible operation and customization for various applications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If electrodes are used to generate plasma, then plasma generation is achieved, but electrode melting and debris production occur
Solution Approach 1:
The patent removes electrodes entirely from the plasma generation system, extracting the harmful component that causes melting and debris. Instead, an electrodeless plasma source is used where plasma is generated through inductive coupling or other non-contact methods, eliminating the source of electrode contamination while maintaining plasma generation capability.
Solution Approach 2:
The mechanical contact-based electrode system is replaced with a field-based plasma generation method. Electromagnetic fields are used to induce plasma without physical contact, substituting the mechanical electrode-plasma interaction with a field-driven process that avoids material degradation and debris generation.
2Productivity
If high voltage region is positioned to generate plasma, then plasma generation is effective, but backside access is blocked
Solution Approach 1:
The patent reconfigures the spatial arrangement of high voltage regions and plasma generation zones, utilizing multi-dimensional space utilization. By positioning high voltage regions at specific locations and angles, the design allows plasma generation to occur efficiently while creating open access paths from multiple directions, including backside access, through strategic spatial decomposition.
Solution Approach 2:
The chamber is divided into multiple accessible regions with the high voltage and plasma generation functions separated from the access paths. The design segments the chamber structure so that plasma generation occurs in one zone while maintaining separate access corridors and ports, allowing operators to reach the backside without interfering with the high voltage region.
3Reliability
If grounded region is positioned adjacent to plasma generation region, then electrical grounding is achieved, but ion attraction increases
Solution Approach 1:
An insulating barrier or intermediate region is introduced between the grounded region and the plasma generation region. This intermediary structure provides electrical grounding stability while blocking the direct electrostatic attraction of ions to the grounded surface, allowing the ground to serve its electrical function without creating harmful ion collection effects.
Solution Approach 2:
The design creates equipotential regions or adjusts the electrical potential distribution so that the grounded region does not create strong potential gradients toward the plasma. By making certain regions equipotential or carefully controlling potential transitions, ion attraction is minimized while maintaining proper electrical grounding for system stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration provides a stable, reliable, and versatile EUV light source with adjustable operating conditions, minimizing debris and allowing for peak power or peak brightness optimization, while enabling safe and flexible access to the plasma chamber.
Implementation Method 1
An inner inductive core can be positioned around the plasma generation region to couple current into a plasma loop
Implementation Method 2
A plasma generation region that defines a plasma confinement region... allows generated ultraviolet radiation to pass out of the chamber
Data Source
AI summary
A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.