Inductor Conductor Layout for Stable DC Resistance During Etching
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Solution Overview
Problem
The existing coil components face issues with variations and increases in direct current resistance due to etching processes that erode conductive patterns, leading to potential wiring dissolution.
Innovation Solution
The inductor component design includes a first conductor layer with a protruding portion that deviates from the shortest path to an interlayer insulating layer, combined with a magnetic material region and insulating layers to stabilize the conductor structure, reducing direct current resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the conductive pattern extends straight in a direction orthogonal to the side surface of the substrate, then the wiring structure is simple and easy to manufacture, but the wiring may be eroded and dissolved by the etching solution during manufacturing, causing variation or increase in direct current resistance
Solution Approach 1:
The patent applies curvature by designing the protruding portion of the conductor layer to extend in a direction that is not orthogonal to the side surface, but at an angled direction. This curved/non-orthogonal extension prevents the wiring from being directly exposed to the etching solution while maintaining manufacturing feasibility, thus resolving the contradiction between ease of manufacture and reliability.
2Reliability
If the conductor layer extends in the shortest distance toward the interlayer insulating layer, then the direct current resistance is minimized, but the wiring is more exposed to etching solution and prone to erosion and dissolution
Solution Approach 1:
The patent introduces the protruding portion as an intermediary structure that extends toward the interlayer insulating layer but not in the shortest distance. This protruding portion acts as a mediator that reduces direct exposure to the etching solution while maintaining adequate electrical connection, thus resolving the contradiction between minimizing direct current resistance and reducing etching solution exposure.
3Reliability
If the wiring structure is optimized for electrical performance, then direct current resistance is reduced, but the manufacturing process becomes more complex and prone to erosion during etching
Solution Approach 1:
The patent applies local quality by optimizing only the protruding portion of the conductor layer rather than the entire wiring structure. The protruding portion has a specific angled extension direction that provides protection against etching, while the rest of the wiring structure maintains its electrical optimization. This localized modification resolves the contradiction between electrical performance and manufacturing complexity.
Data Source
AI summary
An inductor component includes a first conductor layer on a first virtual plane, a first inductor wiring that is on the first conductor layer and extends around a first turning axis along a first direction intersecting with the first virtual plane, and a first interlayer insulating layer that is in contact with the first conductor layer and is on a side opposite to the first inductor wiring with respect to the first conductor layer in the first direction. The first conductor layer includes a first main body portion that extends around the first turning axis, and a first protruding portion that extends from the first main body portion in a direction approaching the first turning axis and does not extend in a shortest distance from a connection portion with the main body portion toward an end portion of the first interlayer insulating layer when viewed along the first direction.