Inert Gas Particle Measurement for Chamber Surface Cleanliness
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Solution Overview
Problem
Existing methods for validating the cleanliness of critical chamber parts in semiconductor fabrication are indirect, unable to detect localized variations, require destructive analysis, introduce background contaminants, and are time-consuming, limiting the ability to ensure high precision cleaning and maintain tool performance.
Innovation Solution
A non-destructive method using an inert gas partitioned purge system that directly measures particle cleanliness on critical surfaces of chamber parts, allowing in-line testing with reduced background noise and high precision, utilizing a fixture vessel design to distribute inert gas flow and analyze particles with on-board analyzers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If indirect methods are used to validate cleanliness of critical chamber parts, then the measurement process is simpler, but the measurement precision and ability to detect localized variations deteriorates
Solution Approach 1:
The patent replaces indirect mechanical/chemical analysis methods with direct optical detection using a laser-based particle counter. The laser scanner detects particles on critical surfaces by measuring light scattering, providing direct visual evidence of contamination rather than indirect inference through chemical analysis or mechanical sampling.
Solution Approach 2:
The patent introduces an inert gas flow as an intermediary medium to transport particles from critical surfaces to the particle counter without introducing contamination. The inert gas acts as a carrier that selectively removes particles from exposed surfaces while maintaining a clean environment, enabling direct measurement without background interference.
2Reliability
If destructive analysis methods are used to test for contaminants, then the detection capability is enhanced, but the part cannot be reused and production time increases
Solution Approach 1:
The patent enables the critical chamber part to be tested in its own operational environment without removal to a separate laboratory. The in-situ measurement system allows the part to serve both its functional purpose and its testing purpose simultaneously, eliminating the need for destructive sampling and enabling immediate reuse after verification.
Solution Approach 2:
The patent replaces destructive mechanical analysis (cutting, sampling, microscopy) with non-destructive optical detection using laser scattering. This substitution allows complete inspection of critical surfaces without removing material or damaging the part, maintaining 100% part usability after testing.
3Device complexity
If conventional cleaning validation methods are used, then the process is simpler, but background contaminants are introduced and measurement accuracy deteriorates
Solution Approach 1:
The patent uses an inert gas (such as nitrogen or helium) to create a contamination-free environment during the measurement process. The inert gas flows over critical surfaces to remove particles while preventing introduction of external contaminants, and the same gas is then analyzed by the particle counter to detect particles originating from the critical surfaces without background interference.
4Device complexity
If traditional particle counting methods are used, then the equipment is simpler, but the ability to detect localized particle emissions deteriorates
Solution Approach 1:
The patent segments the critical chamber part into multiple regions with distinct critical surfaces, each exposed to separate inert gas flows. The particle counter analyzes particles from each region independently, enabling localized detection and mapping of contamination sources. This segmentation allows identification of specific problem areas on the part rather than providing only an overall contamination level.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient, high-precision, and rapid validation of surface cleanliness on critical chamber parts, minimizing background contamination and ensuring high-quality tool performance by detecting localized particle emissions prior to packaging.
Implementation Method 1
An inert gas is flowed through the test vessel, wherein the test vessel flows the inert gas past one or more critical surfaces of the part
Implementation Method 2
the test vessel flows the inert gas past one or more critical surfaces of the part
Implementation Method 3
The inert gas is flowed from the test vessel to at least one diffuser
Data Source
AI summary
An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.