Infrared Fluorescent Ink Imaging for Photosensitive Defect Detection
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Solution Overview
Problem
Existing fluorescence imaging systems for defect detection on photosensitive objects, such as printed electrochemical devices, degrade the performance of these materials due to exposure to UV or visible light below 480 nm, which is not addressed by previous technologies.
Innovation Solution
A fluorescence imaging system using fluorescent markers that absorb light at wavelengths equal to or greater than 595 nm and emit light at wavelengths equal to or greater than 650 nm, combined with a source of excitation light at the same wavelength range, to detect defects without damaging the photosensitive materials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If UV light or visible light below 480 nm is used for fluorescence imaging, then defect detection capability is improved, but photosensitive materials undergo discoloration and performance degradation
Solution Approach 1:
The patent changes the excitation wavelength parameter from traditional UV/blue light (below 480 nm) to red light (620-680 nm). This parameter change allows fluorescence imaging to proceed without causing photosensitivity degradation, as the longer wavelength red light does not trigger the photochemical reactions that cause discoloration and performance loss in photosensitive materials like OLEDs and perovskite solar cells
Solution Approach 2:
The patent introduces a specialized fluorescent marker as an intermediary substance that absorbs red light (620-680 nm) and emits fluorescence in the 680-780 nm range. This intermediary enables defect detection through fluorescence imaging while the red light excitation serves as a non-harmful mediator that does not damage the photosensitive substrate
2Loss of information
If traditional fluorescent markers absorbing UV/blue light are used, then imaging contrast is improved, but the photosensitive object performance is degraded
Solution Approach 1:
The patent changes the absorption and emission wavelength parameters of the fluorescent marker. Instead of using markers that absorb UV/blue light (which damage photosensitive materials), the patent employs markers with absorption maxima in the red region (620-680 nm) and emission maxima in the 680-780 nm range, providing sufficient imaging contrast without compromising device performance
Solution Approach 2:
The patent applies fluorescent markers with specific optical properties tailored for red light excitation to the printed regions of photosensitive objects. This localized application of specially-designed fluorescent materials enables defect detection in printed areas while leaving non-printed photosensitive regions unaffected by harmful UV/blue light exposure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively identifies print defects on photosensitive objects without altering their performance, using longer wavelength light that does not cause discoloration or degradation, and provides improved image contrast for defect detection.
Implementation Method 1
a fluorescent marker that absorbs light at wavelengths equal to or greater than 595 nm, and emits fluorescent light at wavelengths equal to or greater than 650 nm
Data Source
AI summary
The present application discloses a method for optical detection of defects on a photosensitive object by fluorescence imaging in the infrared and near-infrared wavelengths of light. The method of fluorescence imaging enables fast and efficient defect detection on the object for quality control. Furthermore, the imaging process does not alter, discolor, or degrade electrical performance of the photosensitive object.