Infrared Window Maintenance Detection in Plasma Processing Chambers
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Solution Overview
Problem
Plasma processing apparatuses face challenges in accurately determining when maintenance of the light-transmitting member is necessary due to contamination, which affects the accuracy of substrate temperature detection and overall processing efficiency.
Innovation Solution
A plasma processing apparatus and method that includes a sensor to measure infrared rays through a light-transmitting member, with a determination section to assess the need for maintenance based on measurement values, using various strategies such as comparing with a threshold, timing without plasma generation, or estimating convergence values.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the light-transmitting member is used to transmit infrared rays for substrate temperature detection, then the substrate temperature can be monitored during plasma processing, but the light-transmitting member becomes contaminated with deposits which blocks infrared rays and reduces detection accuracy
Solution Approach 1:
The system performs preliminary actions by acquiring measurement values at specific timing (when no plasma is generated or substrate is not present) to establish baseline data before contamination significantly impacts detection. This allows the determination section to compare subsequent measurements against these baseline values to detect contamination levels.
Solution Approach 2:
The determination section continuously monitors measurement values and provides feedback about the light-transmitting member's contamination state. By comparing measurement values taken at different timings (with and without plasma, with and without substrate), the system feedbacks whether maintenance is needed, enabling proactive contamination management.
2Measurement precision
If the light-transmitting member is maintained frequently to prevent contamination, then detection accuracy is maintained, but operational time is reduced due to maintenance interruptions
Solution Approach 1:
The system performs preliminary measurements at optimal timings (when plasma is not generated or substrate is absent) to establish reference values before contamination degrades performance. This allows maintenance to be scheduled based on actual contamination levels rather than fixed intervals, maximizing operational time between maintenances.
Solution Approach 2:
The determination section automatically assesses the maintenance need by comparing measurement values, enabling the system to self-monitor its own contamination state. This eliminates the need for manual inspection and allows maintenance to be performed only when actually necessary, improving productivity.
3Productivity
If the light-transmitting member is not maintained, then operational time is maximized, but deposition on the member blocks infrared rays making accurate temperature detection difficult
Solution Approach 1:
The determination section provides continuous feedback about the light-transmitting member's condition by comparing measurement values taken under different conditions (with/without plasma, with/without substrate). When the difference exceeds a threshold, the system feedbacks that maintenance is needed, allowing the system to operate for maximum time while still monitoring detection quality.
Solution Approach 2:
The system performs preliminary assessments using measurement values acquired at specific timings to establish baseline performance. This allows the system to operate without maintenance for extended periods while periodically checking whether contamination has degraded detection accuracy below acceptable levels.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables timely and accurate determination of when maintenance of the light-transmitting member is required, ensuring consistent plasma processing quality and increasing operational efficiency by preventing contamination-related issues.
Implementation Method 1
a sensor that receives infrared rays emitted from the stage or the substrate placed on the stage through the light-transmitting member
Data Source
AI summary
A disclosed plasma processing apparatus includes a chamber having an opening, a plasma generation section that generates plasma in the chamber, a light-transmitting member that blocks at least a part of the opening and that transmits infrared rays, a stage that is provided in the chamber and on which the substrate is to be placed, and a sensor that receives the infrared rays emitted from the stage or the substrate placed on the stage through the light-transmitting member and outputs a measurement value corresponding to the intensity of the received infrared rays, and a determination section. The determination section determines whether or not maintenance of the light-transmitting member is necessary based on the measurement value.