Reaction Chamber Injector Geometry to Reduce Clogging and Breakage

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Solution Overview

Problem

Existing injectors in substrate processing apparatuses face issues with clogging and breakage due to deposition of reaction gases, which leads to inefficiencies and downtime in the vertical furnace process.

Innovation Solution

The design of an elongated injector with an internal gas conduction channel and varying wall thickness, made from materials like silicon carbide or silicon, which matches the thermal expansion of deposited materials, reduces deposition and stress, thereby minimizing clogging and breakage risks.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the injector is used in the reaction chamber to inject process gas, then the deposition reaction on wafers is enabled, but the reaction gas deposits on the internal gas conduction channel causing clogging and breakage

Engineering Contradiction:
Improvedeposition reaction efficiencyVSAvoidinjector clogging and breakage
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent changes the geometric parameters of the injector, specifically making the width (extending along the second axis perpendicular to the first axis) substantially larger than the depth (extending along the third axis perpendicular to the first and second axis). This parameter change modifies the deposition pattern and reduces material accumulation in the gas conduction channel, thereby preventing clogging and breakage while maintaining deposition reaction efficiency

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The injector employs an asymmetric design where the width is substantially larger than the depth, creating an elongated shape along the first axis. This asymmetric geometry alters the gas flow dynamics and deposition behavior within the reaction chamber, reducing harmful deposits on the gas conduction channel while enabling effective process gas injection for wafer deposition

Inventive Principle:
Principle #4Asymmetry

2Duration of action of stationary object

If the injector operates continuously in the high-temperature reaction chamber, then the deposition process is maintained, but thermal stress causes breakage of the injector

Engineering Contradiction:
Improvecontinuous operation capabilityVSAvoidinjector resistance to thermal stress
Core Design Contradiction:
Duration of action of stationary objectVSStrength

Solution Approach 1:

The patent modifies the geometric parameters by creating an elongated injector shape with width substantially larger than depth. This parameter change reduces the cross-sectional area exposed to thermal gradients, thereby minimizing thermal stress accumulation during continuous operation in the high-temperature reaction chamber and preventing breakage

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The injector design anticipates thermal stress accumulation by pre-configuring an elongated geometry with width larger than depth. This preliminary design choice reduces the injector's susceptibility to thermal stress before operation begins, enabling continuous operation without breakage while maintaining deposition process integrity

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively reduces the risk of clogging and breakage, prolongs the injector's lifespan, and maintains the integrity of the vertical furnace process by matching thermal expansion with deposited materials, ensuring consistent operation and reducing downtime.

Implementation Method 1

made from materials like silicon carbide or silicon, which matches the thermal expansion of deposited materials

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Data Source

PatentEP4006960B1An injector configured for arrangement within a reaction chamber of a substrate processing apparatus
Publication Date: 2024.10.09 ASM IP HLDG BV
  • EP4006960B1 patent drawingFigure 1
  • EP4006960B1 patent drawingFigure 2
  • EP4006960B1 patent drawingFigure 3

AI summary

The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.