Inkjet Masked Ion Beam Alignment for LCD Substrates
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Solution Overview
Problem
Conventional methods for fabricating LCDs, particularly MVA LCDs, face issues with mura defects, reduced transmittance, and aperture ratio due to complex and costly lithography processes, as well as the use of slit patterns or protrusions that lead to non-uniform electric fields.
Innovation Solution
A method involving inkjet printing to form mask layers on alignment material layers, followed by particle beam alignment processes, allowing for the formation of alignment films with different alignment directions without the need for slit patterns or protrusions, thereby simplifying the process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If ion beam alignment method is used with lithography process to form mask, then alignment effect is achieved, but process complexity increases and cost increases
Solution Approach 1:
The patent extracts and removes the lithography process from the ion beam alignment method. Instead of using lithography to form masks, the invention directly applies ion beam irradiation to the alignment material layer without any mask formation steps, thereby eliminating the complex lithography process while maintaining the alignment effect
Solution Approach 2:
The patent introduces a photoresist layer as an intermediary substance that enables direct ion beam irradiation without lithography masks. The photoresist layer is formed on the alignment material layer and serves as a temporary protective layer during ion beam treatment, allowing precise alignment without the need for complex mask fabrication and alignment processes
2Adaptability or versatility
If protrusions or slit patterns are fabricated on substrates to achieve wide viewing angle, then viewing angle is improved, but mura defects occur due to non-uniform electric field
Solution Approach 1:
The patent applies local quality by creating different alignment directions in different regions of the display panel through multi-directional ion beam irradiation. Each region receives ion beam treatment from specific angles, creating locally optimized alignment patterns that achieve wide viewing angles without the need for protrusions or slits, thereby avoiding mura defects
Solution Approach 2:
The patent changes the alignment parameters of the alignment material layer by controlling ion beam irradiation angles and energies. By varying the ion beam incidence angles in different processing steps, the patent creates diverse alignment directions without modifying the physical structure of the substrates, thus avoiding the electric field non-uniformity caused by protrusions or slits
3Adaptability or versatility
If protrusions or slit patterns are fabricated on substrates, then wide viewing angle is achieved, but transmittance and aperture ratio are reduced
Solution Approach 1:
The patent replaces the mechanical structure approach (protrusions and slits) with a field-based approach (ion beam irradiation). Instead of physically modifying the substrate structure to achieve wide viewing angles, the patent uses ion beam energy to directly align the liquid crystal molecules, eliminating the need for light-blocking protrusions and slits, thereby maintaining high transmittance and aperture ratio
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach eliminates mura defects, enhances transmittance, and improves the aperture ratio of LCD panels by allowing liquid crystal molecules to be arranged in different directions, achieving a wider viewing angle without the use of complex designs.
Implementation Method 1
A mask layer is formed on a portion of the alignment regions on the alignment material layer by using an inkjet printing process
Implementation Method 2
a particle beam alignment process is performed to the exposed alignment material layer
Data Source
AI summary
A method of fabricating an active device array substrate is provided. First, a substrate is provided. A pixel array is formed on the substrate. An alignment material layer having a plurality of alignment regions is formed on the pixel array. A mask layer is formed on a portion of the alignment regions on the alignment material layer by using an inkjet printing process, so as to expose another portion of the alignment regions on the alignment material layer. Then, a particle beam alignment process is performed to the exposed alignment material layer. Then, the mask layer is removed. Another mask layer is formed on the alignment material layer which has been treated by the particle beam to expose the alignment material layer not treated by the particle beam. Another particle beam alignment process is performed to the exposed alignment material layer, and then the another mask layer is removed.