Inkjet Soluble Mask Patterning for Optical Films
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Solution Overview
Problem
Current methods for manufacturing optical device films are costly and inefficient, particularly in achieving sub-micron scale patterning required for advanced applications like augmented reality.
Innovation Solution
The method involves depositing liquid ink drops containing a soluble film fluid onto an optical device substrate using an inkjet deposition system, forming a patterned inkjet coating layer, and then lifting off this layer with a detergent to create a patterned optical device film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional lithography and etch processes are used for sub-micron scale patterning, then manufacturing precision is improved, but production cost increases and productivity decreases
Solution Approach 1:
The patent replaces traditional mechanical lithography and etch processes with an inkjet printing system that deposits soluble mask material directly onto the substrate. This substitution enables sub-micron scale patterning through precise digital control of inkjet nozzles, achieving the required manufacturing precision while significantly reducing production costs and improving throughput compared to conventional mechanical methods
Solution Approach 2:
The patent changes the state of the mask material from permanent photoresist to soluble material that can be dissolved by detergent. This parameter change allows the mask to be selectively removed after deposition, enabling the lift-off process to create the desired patterned optical device film while simplifying the manufacturing process and reducing costs
2Productivity
If inkjet deposition with soluble mask is used, then production cost decreases and productivity improves, but manufacturing precision may be compromised
Solution Approach 1:
The patent replaces traditional mechanical lithography and etch processes with an inkjet printing system that deposits soluble mask material directly onto the substrate. This substitution enables sub-micron scale patterning through precise digital control of inkjet nozzles, achieving the required manufacturing precision while significantly reducing production costs and improving throughput compared to conventional methods
Solution Approach 2:
The patent introduces a soluble mask material as an intermediary layer that is deposited by inkjet printing, allows optical device material deposition, and then is selectively removed by detergent. This intermediary approach enables precise patterning through the lift-off process while maintaining the advantages of inkjet deposition in terms of cost and productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the cost-effective fabrication of micron-scale patterned optical device films, significantly reducing production costs compared to traditional lithography and etch processes.
Implementation Method 1
depositing a plurality of liquid ink drops on the optical device substrate from one or more nozzles of an inkjet deposition system
Implementation Method 2
immersing the optical device substrate in a detergent capable of dissolving the patterned inkjet coating layer
Implementation Method 3
agitating the optical device substrate in the detergent by performing a sonication process to lift-off the patterned inkjet coating layer
Data Source
AI summary
Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing a patterned optical device film on an optical device substrate. According to certain embodiments, an inkjet deposition process is used to deposit a patterned inkjet coating layer on the optical device substrate. A deposition process may then be used to deposit an optical device material on the patterned inkjet coating and the optical device substrate. The patterned inkjet coating on the optical device substrate may then be washed with an appropriate detergent to lift-off the patterned inkjet coating layer from the optical device substrate to form the patterned optical device film.