Inline Thin Film Processing via Magnetic Levitation
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Solution Overview
Problem
Conventional thin film processing methods, such as cyclic atomic layer deposition, face limitations in wide-area product manufacturing due to slow film formation rates, particle generation, mechanical failures, and non-uniformity, particularly in applications like displays and solar cells.
Innovation Solution
An inline thin film processing apparatus with a circular transport track, magnetic levitation-type linear motor, and adjustable susceptor height, featuring a showerhead with a gas supply and purge system, and collision prevention mechanisms, enables efficient and uniform thin film deposition across large areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If cyclic atomic layer deposition method is used, then high quality thin film with atomic layer thickness is formed uniformly at low temperature, but film formation rate is slow
Solution Approach 1:
The patent replaces the conventional cyclic ALD mechanical transport system with a magnetic levitation-based linear motor system. This substitution enables continuous linear transport of substrates through the processing chamber, eliminating the slow cyclic deposition process while maintaining film quality through precise magnetic field-controlled positioning and continuous gas flow delivery.
2Quantity of substance
If reciprocating transport of susceptor/substrate is used, then film deposition is achieved, but particles are generated and mechanical failures occur due to repeated acceleration and stop
Solution Approach 1:
The patent replaces mechanical contact-based reciprocating transport with a magnetic levitation system that uses magnetic fields for acceleration and deceleration. This eliminates mechanical contact, friction, and associated wear, thereby preventing particle generation and mechanical failures while maintaining reliable substrate transport and film deposition.
Solution Approach 2:
The patent introduces magnetic fields as an intermediary between the susceptor and the transport mechanism. The magnetic levitation system uses magnetic fields to couple with the susceptor, enabling contactless transport, precise positioning, and controlled acceleration/deceleration without mechanical contact, thus eliminating particle generation and mechanical failures.
3Productivity
If turntable method with circulating transport is used, then mass production is enabled, but uniformity of film formation cannot be ensured and large area expansion is difficult
Solution Approach 1:
The patent employs a linear transport path with curved sections designed to maintain uniform magnetic field distribution and consistent substrate positioning throughout the chamber. The linear configuration with optimized curvature ensures that all substrates receive uniform gas flow and deposition conditions, achieving both mass production capability and film formation uniformity across large areas.
Solution Approach 2:
The patent implements localized gas distribution systems and magnetic field zones along the linear transport path. Each section of the chamber is optimized for specific deposition conditions, ensuring uniform film formation across different positions. The linear configuration allows for precise local control of gas flow, temperature, and magnetic field strength to maintain consistency across large substrate areas.
4Manufacturing precision
If conventional cyclic ALD method is used, then high dielectric constant thin film is formed for semiconductor DRAM, but the method is not suitable for wide-area products like displays and solar cells
Solution Approach 1:
The patent transitions from the conventional cyclic ALD method that processes substrates in a confined cyclic path to a linear transport system that extends the processing dimension. This linear configuration with extended chamber length allows for continuous processing of large-area substrates while maintaining the precise gas flow control and deposition conditions necessary for high-K thin film quality across the entire substrate area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances thin film deposition rates, supports wide-area expansion, and multi-component deposition, reducing mechanical failures and particle generation while ensuring uniformity and precision in film formation.
Implementation Method 1
one or more transporters, each of which supports the susceptor, transports the susceptor along the transport path while floating with respect to the track and not contacting the track
Implementation Method 2
the transporter may have a structure of a magnetic levitation-type linear motor
Implementation Method 3
a thin film processing showerhead which performs thin film processing for the substrate on the transport track and comprises at least one or more of a source gas supply module, a purge gas supply module, a reaction gas supply module, and a gas exhaust module
Data Source
AI summary
A thin film processing device includes a showerhead for performing thin film processing for a substrate on a susceptor that moves along a transport track, and one or more transporters for supporting the susceptor. The transporters can transport the susceptor along the transport track while floating with respect to the track and not contacting the track, and can also control the height of the susceptor so as to adjust the distance from the substrate to the showerhead; and a transporter control system for controlling the transporters.