Inline Steam Filtration for Particle-Free Selective Oxidation
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Solution Overview
Problem
Steam oxidation in semiconductor manufacturing can introduce particle contaminants into the device, impairing its functionality and limiting operating conditions.
Innovation Solution
A method involving the use of a filtration module to filter particles greater than 1 nm from a hydrogen-containing gas before introducing it into the processing chamber, maintaining the hydrogen gas at pressures of 250 Torr to 800 Torr and heating the chamber to promote selective oxidation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If steam oxidation is used for selective oxidation of silicon containing layers, then oxidation effectiveness is improved, but particle contamination increases
Solution Approach 1:
A filtration module is introduced as an intermediary component between the steam source and the processing chamber. The filter captures particles greater than 1 nm from the steam flow before the steam enters the chamber, thereby maintaining the effectiveness of steam oxidation while eliminating particle contamination. This intermediary device resolves the contradiction by allowing the beneficial steam oxidation process to continue while blocking the harmful particles.
2Productivity
If high chamber pressure and high steam ratio are used, then oxidation rate is improved, but particle contamination increases
Solution Approach 1:
The filtration module serves as a mediator that allows high chamber pressure and high steam ratio conditions to be maintained for improved oxidation rate, while simultaneously removing particles from the steam flow. The filter enables these aggressive processing conditions without the detrimental side effect of particle contamination.
Solution Approach 2:
The filtration module extracts particles from the steam flow by capturing them in the filter medium. This separation allows the steam to continue at high pressure and ratio for effective oxidation, while the harmful particles are removed before entering the processing chamber.
3Adaptability or versatility
If steam is used for oxidation, then selective oxidation capability is improved, but device functionality deteriorates due to particle introduction
Solution Approach 1:
The filtration module acts as an intermediary that preserves the selective oxidation capability of steam while protecting device functionality by removing particles. The filter allows steam to selectively oxidize silicon containing layers without introducing contaminants that would impair device performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The filtration module effectively reduces particle contamination in the oxide layer, improving device performance and allowing for more efficient steam oxidation without introducing contaminants.
Implementation Method 1
The hydrogen containing gas is directed through a filter to the chamber. The filter is configured to filter particles greater than about 1 nm.
Implementation Method 2
The chamber is heated to a predetermined temperature for a predetermined period of time while maintaining the hydrogen containing gas in the chamber. The substrate is selectively oxidized.
Data Source
AI summary
A method for selective oxidation of a substrate. The substrate is disposed in a chamber. A hydrogen containing gas is introduced to the chamber. The hydrogen containing gas is directed through a filter to the chamber. The filter is configured to filter particles greater than about 1 nm. The chamber is pressurized to a pressure of about 250 Torr to about 800 Torr while maintaining the hydrogen containing gas in the chamber. The chamber is heated to a predetermined temperature for a predetermined period of time while maintaining the hydrogen containing gas in the chamber. The substrate is selectively oxidized.