Inorganic Dielectric Direct Bonding for Microelectronic Assemblies
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Solution Overview
Problem
Conventional semiconductor assembly techniques using low temperature polymer dielectrics limit the temperature processing of composite dies, leading to wafer bow issues and reduced heat transfer, which affects processor performance and manufacturing efficiency.
Innovation Solution
The use of inorganic dielectric materials for direct bonding and thermally conductive fill materials in microelectronic assemblies allows for higher temperature processing and improved heat dissipation, enabling more streamlined manufacturing and better handling of composite dies.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If low temperature polymer dielectric materials are used in semiconductor assembly, then the assembly can be processed at lower temperatures, but heat transfer is reduced and processor performance deteriorates
Solution Approach 1:
The patent changes the material parameter from polymer dielectric to inorganic dielectric, which enables higher temperature processing while maintaining or improving heat transfer properties. This material substitution fundamentally alters the thermal characteristics of the assembly.
Solution Approach 2:
The patent employs composite material structures including inorganic dielectric layers combined with thermally conductive fill materials. This composite approach allows simultaneous achievement of electrical insulation and enhanced thermal management capabilities.
2Temperature
If low temperature polymer dielectric materials are used in semiconductor assembly, then processing can be performed at lower temperatures, but wafer bow increases and manufacturing precision deteriorates
Solution Approach 1:
The patent changes the material parameter from polymer dielectric to inorganic dielectric, which enables higher temperature processing while maintaining or improving heat transfer properties. This material substitution fundamentally alters the thermal characteristics of the assembly.
Solution Approach 2:
The patent replaces the mechanical/physical constraints of polymer dielectric materials with inorganic dielectric materials that have superior dimensional stability and thermal performance, eliminating wafer bow issues associated with polymer-based assemblies.
3Loss of energy
If higher temperature processing is implemented, then heat transfer improves and processor performance increases, but damage to dies or interconnects may occur
Solution Approach 1:
The patent employs composite material structures including inorganic dielectric layers combined with thermally conductive fill materials. This composite approach allows simultaneous achievement of electrical insulation and enhanced thermal management capabilities.
Solution Approach 2:
The inorganic dielectric material acts as an intermediary that enables efficient heat transfer while protecting sensitive dies and interconnects from direct thermal damage. It serves as a thermal management layer that mediates between heat-generating components and the surrounding environment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances heat transfer and reduces wafer bow, improving processor performance and manufacturing efficiency by allowing higher temperature processing without damaging the dies or interconnects.
Implementation Method 1
The mold material can negatively affect processor performance by limiting heat transfer away from hot spots in the IC package
Implementation Method 2
a first microelectronic component coupled to the second surface of the interposer by a first direct bonding region
Data Source
Figure 1
Figure 2
Figure 3A~3B
AI summary
Disclosed herein are microelectronic assemblies including microelectronic components that are coupled together by direct bonding, and related structures and techniques. In some embodiments, a microelectronic assembly may include an interposer; a first microelectronic component having a first surface coupled to the interposer by a first direct bonding region and an opposing second surface; a second microelectronic component having a first surface coupled to the interposer by a second direct bonding region and an opposing second surface; a liner material on the surface of the interposer and around the first and second microelectronic components; an inorganic fill material on the liner material and between the first and second microelectronic components; and a third microelectronic component coupled to the second surfaces of the first and second microelectronic components. In some embodiments, the liner material, the inorganic fill material, and a material of the third microelectronic component may include a thermally conductive material.