Embedded Inspection Substrate for Lithographic Apparatus Contamination Detection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Lithographic apparatuses face challenges in minimizing downtime for maintenance and inspection, as opening the complex machines for contamination detection in the liquid confinement system is time-consuming and risky, potentially leading to further contamination and productivity losses.
Innovation Solution
An inspection substrate with embedded illumination and imaging devices is designed to be compatible with the apparatus, allowing for in-situ inspection of components like the liquid confinement structure without disrupting the operation, by emitting radiation that does not contribute to the image generated, enabling detection of contamination or damage during normal operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the lithographic apparatus is opened for maintenance and inspection to detect contamination in the liquid confinement system, then contamination can be detected, but the apparatus experiences extended downtime and risk of further contamination
Solution Approach 1:
The inspection substrate is designed to be loaded and inspected while the apparatus remains closed and operational. The illumination and imaging devices are pre-positioned to inspect critical components without requiring the apparatus to be opened, thus performing the inspection action before any potential contamination risk arises from opening the system.
Solution Approach 2:
An inspection substrate acts as an intermediary carrier that enables indirect inspection of the liquid confinement system. Instead of directly opening the apparatus to inspect components, the inspection substrate with embedded imaging devices serves as a mediator to capture images of internal components through the closed apparatus structure.
2Measurement precision
If the lithographic apparatus is opened for maintenance and inspection, then contamination can be detected, but the apparatus is at risk of further contamination
Solution Approach 1:
The inspection is performed preliminarily while the apparatus remains closed and under controlled conditions. By using the inspection substrate to examine components before opening the apparatus, contamination detection occurs in advance, eliminating the need to open the system and thereby preventing further contamination risk.
Solution Approach 2:
The inspection substrate serves as an intermediary that enables contamination detection without direct exposure of the apparatus interior to the external environment. The imaging devices on the inspection substrate capture images through the closed apparatus structure, acting as a mediator that eliminates the harmful effect of potential contamination from opening the system.
3Measurement precision
If traditional inspection methods requiring apparatus opening are used, then detailed inspection is possible, but productivity decreases due to extended downtime
Solution Approach 1:
The inspection substrate with pre-positioned illumination and imaging devices enables preliminary inspection to be conducted during normal operation. Critical components are inspected in advance without stopping production, maintaining high productivity while achieving detailed inspection quality through the specialized imaging setup.
Solution Approach 2:
The traditional mechanical approach of opening the apparatus for inspection is replaced by an optical system. The inspection substrate with embedded illumination and imaging devices uses optical fields to inspect components through the closed apparatus, substituting mechanical opening operations with non-contact optical measurement, thereby maintaining productivity.
4Productivity
If the apparatus remains closed for continuous operation, then productivity is maintained, but contamination in the liquid confinement system cannot be detected
Solution Approach 1:
The inspection substrate acts as an intermediary that enables contamination detection while the apparatus remains closed. The embedded imaging devices on the inspection substrate capture images of the liquid confinement system components through the closed apparatus structure, providing contamination detection capability without interrupting productivity.
Solution Approach 2:
The physical opening of the apparatus for inspection is replaced by an optical inspection system. The illumination and imaging devices on the inspection substrate use electromagnetic radiation to examine components through the closed apparatus, substituting mechanical access with optical measurement, thereby maintaining both productivity and detection capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces downtime and minimizes contamination risks by allowing for quick, non-invasive inspection of critical components, maintaining productivity and reducing the need for extensive decontamination processes.
Implementation Method 1
an illumination device embedded in the body, the illumination device configured to emit radiation toward target area of the component of the apparatus
Implementation Method 2
an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation
Data Source
AI summary
An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.