Insulating Gas Ring for Plasma Systems

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Solution Overview

Problem

High radio frequency power in HDP-CVD systems induces arcing, leading to damage and contamination in the plasma system, resulting in substrate defects or scrap.

Innovation Solution

A gas ring with an insulating protective layer, such as a crystalline metal oxide layer, is used to isolate the gas ring body from plasma, preventing arcing and damage. The insulating layer is formed using methods like anodic oxidation or micro arc plasma oxidation, providing high voltage breakdown resistance and anti-abrasion properties.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If high radio frequency power is applied to promote plasma formation and enhance CVD deposition, then the reactivity of plasma species increases and deposition efficiency improves, but arcing is induced which causes damage and contamination to the gas ring and substrates

Engineering Contradiction:
Improvedeposition efficiencyVSAvoidarcing damage
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

An insulating protective layer is introduced as an intermediary between the conductive gas ring body and the plasma environment. This protective layer acts as a mediator that prevents direct interaction between the high RF plasma and the gas ring, thereby eliminating arcing damage while preserving the benefits of high power plasma processing

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The gas ring is transformed from a simple conductive structure into a composite structure with an insulating protective layer coating the conductive body. This composite design combines the electrical conductivity needed for RF coupling with the insulation properties that prevent arcing, resolving the contradiction between productivity and harmful effects

Inventive Principle:
Principle #40Composite materials

2Power

If the gas ring body is made conductive to facilitate RF coupling and plasma generation, then plasma formation is enhanced, but the conductive surface becomes susceptible to arcing and contamination

Engineering Contradiction:
ImproveRF coupling efficiencyVSAvoidresistance to arcing
Core Design Contradiction:
PowerVSReliability

Solution Approach 1:

The gas ring structure is designed with different local properties: the inner surface maintains conductivity for effective RF coupling and plasma generation, while the outer surface is coated with an insulating protective layer to prevent arcing. This local differentiation of electrical properties resolves the contradiction between power coupling efficiency and arcing resistance

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The insulating protective layer effectively prevents arcing and subsequent contamination, reducing substrate defects and ensuring reliable plasma processing by maintaining the integrity of the gas ring and substrates.

Implementation Method 1

an insulating protective layer covering the surface of the gas ring body... the insulating protective layer is configured to isolate the gas ring body from plasma

Methodology Applied
Scientific EffectElectrical insulation: Dielectric

Implementation Method 2

providing high voltage breakdown resistance and anti-abrasion properties

Methodology Applied
Scientific EffectAbrasion resistance: Abrasion

Implementation Method 3

High radio frequency power however induces arcing in the HDP-CVD system

Methodology Applied
Scientific EffectRadio frequency electrical conduction: Conduction (electrical)

Data Source

PatentUS10269544B2Gas ring for plasma system and method of manufacturing the same
Publication Date: 2019.04.23 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US10269544B2 patent drawing
  • US10269544B2 patent drawing
  • US10269544B2 patent drawing

AI summary

A gas ring for a plasma system includes a gas ring body having a surface and an insulating protective layer covering the surface. Methods of manufacturing the gas ring are also provided.