Insulating Mask and Metal Shield for Cylindrical Film Formation
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Solution Overview
Problem
Existing film forming apparatuses face inefficiencies and increased costs due to the need for frequent replacement of mask members and complex processes for removing films from metal mask members, which affects the quality and yield of film formation on cylindrical works.
Innovation Solution
A film forming apparatus utilizing a cylindrical mask member made of insulation material and a shield member made of metal, which prevents film formation on non-target areas and avoids adhesion to the mask member, allowing for efficient and cost-effective partial film formation on cylindrical works while maintaining good film quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a metal mask member is used, then the mask member can be reused after film removal, but the film adheres to the mask member requiring expensive removal facilities and complex processes
Solution Approach 1:
The patent uses a disposable insulating mask member that is discarded after single use. This eliminates the need for complex film removal processes and expensive facilities, as the mask member is not reused. The low cost of the insulating material makes this disposable approach economically viable.
Solution Approach 2:
The patent changes the electrical parameter (electrical conductivity) of the mask member from conductive (metal) to insulating. This parameter change prevents film adhesion to the mask member surface, thereby eliminating the need for film removal processes and enabling simple disposal after use.
2Strength
If a metal mask member is used, then the mask member can provide structural strength, but film formation quality decreases due to mask member disassembly or decomposition
Solution Approach 1:
The patent changes the electrical parameter (electrical conductivity) of the mask member from conductive (metal) to insulating. This parameter change prevents film adhesion to the mask member surface, thereby eliminating the need for film removal processes and enabling simple disposal after use.
Solution Approach 2:
The patent uses a disposable insulating mask member that is discarded after single use. This eliminates the need for complex film removal processes and expensive facilities, as the mask member is not reused. The low cost of the insulating material makes this disposable approach economically viable.
3Manufacturing precision
If the mask member is made of insulation material, then film adhesion to the mask member is avoided, but the mask member may be affected by plasma
Solution Approach 1:
The patent uses a disposable insulating mask member that is discarded after single use. This eliminates the need for complex film removal processes and expensive facilities, as the mask member is not reused. The low cost of the insulating material makes this disposable approach economically viable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus enables efficient and cost-effective partial film formation on cylindrical works by preventing film adhesion to the mask member and reducing the need for expensive facilities and complex removal processes, thereby improving material yield and reducing the frequency of mask member replacement.
Implementation Method 1
a plasma chemical vapor deposition method
Implementation Method 2
a plasma chemical vapor deposition method
Data Source
AI summary
The film forming apparatus includes a mask member and a shield member. The mask member is made of a cylindrical insulation material that can expose inner surfaces of cylinder bores, and mask the inner surface of a crankcase. The shield member is made of a metal material disposed along an inner surface of the mask member.