Integrated Black Matrix and Column Spacer for LCD Manufacturing
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Solution Overview
Problem
The manufacturing process of liquid crystal displays is complicated and costly due to the need for separate processes to form spacers, which also leads to impurity ion elution and defects, affecting display quality.
Innovation Solution
A method involving the formation of a black column spacer on a substrate using a photoresist with two initiators of different maximum energy absorption wavelengths, where the black matrix and column spacer are integrally formed to maintain the cell gap and improve display quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate processes are used to form spacers (photolithography, exposure using transfer film), then the spacer can be formed, but the manufacturing process becomes complicated and manufacturing cost increases
Solution Approach 1:
The patent combines the black matrix and column spacer into a single integrated structure formed by one photoresist layer. The photoresist is patterned to create both the black matrix regions and column spacer regions simultaneously, eliminating the need for separate formation processes. This merging approach reduces process complexity while maintaining the functional integrity of both components.
Solution Approach 2:
The photoresist layer serves multiple functions: it acts as the black matrix material for light blocking, provides the column spacer structure for cell gap maintenance, and serves as a single patterning target for both features. This multi-functionality eliminates the need for separate materials and processes for black matrix and spacer formation.
2Reliability
If separate processes are used to form spacers, then the spacer can be formed, but manufacturing cost increases
Solution Approach 1:
The patent combines the black matrix and column spacer into a single integrated structure formed by one photoresist layer. The photoresist is patterned to create both the black matrix regions and column spacer regions simultaneously, eliminating the need for separate formation processes. This merging approach reduces process complexity while maintaining the functional integrity of both components.
Solution Approach 2:
The photoresist layer serves multiple functions: it acts as the black matrix material for light blocking, provides the column spacer structure for cell gap maintenance, and serves as a single patterning target for both features. This multi-functionality eliminates the need for separate materials and processes for black matrix and spacer formation.
3Reliability
If separate processes are used to form spacers, then the spacer can be formed, but impurity ion elution and defects occur, affecting display quality
Solution Approach 1:
The patent combines the black matrix and column spacer into a single integrated structure formed by one photoresist layer. The photoresist is patterned to create both the black matrix regions and column spacer regions simultaneously, eliminating the need for separate formation processes. This merging approach reduces process complexity while maintaining the functional integrity of both components.
Solution Approach 2:
The patent removes the intermediate transfer film that was previously required for spacer formation. By directly patterning the photoresist to form both black matrix and spacer regions, the transfer film step is eliminated, thereby removing the source of impurity ion elution associated with transfer film processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, reduces costs, minimizes impurity ion elution and defects, and enhances display quality by integrating the black matrix and column spacer functions into a single step, improving transmittance and side visibility.
Implementation Method 1
The photoresist includes at least two initiators having different maximum energy absorption wavelengths from each other... exposing the photoresist to a first light, developing the exposed photoresist and exposing the photoresist to a second light
Data Source
AI summary
In a method of manufacturing a display apparatus, a first substrate including a plurality of pixels is formed, and a black column spacer is formed on the first substrate. A second substrate is formed, and a liquid crystal layer is formed between the first substrate and the second substrate. The black column spacer is formed by coating a photoresist on the first substrate, exposing the photoresist to a first light, developing the exposed photoresist and exposing the developed photoresist to a second light.