Integrated Capacitance Diaphragm Gauge for Line Charge Volume
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Solution Overview
Problem
Existing semiconductor processing equipment face challenges in accurately measuring and delivering precise bursts of gases due to measurement errors and inefficiencies in pressure sensing, particularly in line charge volume systems with separate pressure gauges, leading to suboptimal gas delivery and prolonged purging times.
Innovation Solution
Integration of a capacitance diaphragm gauge directly within the line charge volume chamber, allowing for direct pressure sensing and eliminating measurement errors, enabling faster and more efficient gas delivery by correlating diaphragm deflection to pressure volume, and reducing purging inefficiencies through airtight seals and efficient gas flow management.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a separate capacitance diaphragm gauge is used to measure pressure in the line charge volume, then pressure measurement is possible, but measurement errors occur due to pressure differences between the gauge and the charge volume
Solution Approach 1:
The pressure sensor is integrated directly into the line charge volume chamber, merging the measurement device with the measured system. This eliminates the separate pressure sensing path and ensures the sensor measures the actual pressure of the gas in the charge volume without transmission errors or equilibrium delays.
2Ease of manufacture
If a separate pressure gauge is used outside the line charge volume chamber, then the chamber structure remains simple, but purging becomes inefficient due to dead leg volumes
Solution Approach 1:
The pressure sensor is integrated directly into the line charge volume chamber, merging the measurement device with the measured system. This eliminates the separate pressure sensing path and ensures the sensor measures the actual pressure of the gas in the charge volume without transmission errors or equilibrium delays.
3Productivity
If pressure is measured using a separate gauge, then the line charge volume can be charged, but waiting time for pressure equilibrium is required
Solution Approach 1:
The pressure sensor is integrated directly into the line charge volume chamber, merging the measurement device with the measured system. This eliminates the separate pressure sensing path and ensures the sensor measures the actual pressure of the gas in the charge volume without transmission errors or equilibrium delays.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution provides accurate and efficient mass measurement of gases, independent of charging methods, reduces waiting times for equilibrium, and enhances the precision and speed of gas delivery to semiconductor reactors, improving the quality of thin film deposition processes.
Implementation Method 1
The measurement side includes electronics for measuring a capacitance value corresponding to the deflection of the diaphragm
Implementation Method 2
pressure produced by a gas that is provided into the chamber via the inlet port produces a force upon the diaphragm
Data Source
AI summary
A line charge volume and methods for use in delivery of gas to a reactor for processing semiconductor wafers is provided. The line charge volume includes a chamber that extends between a first end and a second end, and the first end includes an inlet port and an outlet port. A pressure sensor is integrated with the chamber. The pressure sensor has a measurement side for measuring a deflection of a diaphragm. The diaphragm is directly exposed to an interior of the chamber so that pressure produced by a gas that is provided into the chamber via the inlet port produces a force upon the diaphragm. The measurement side includes electronics for measuring a capacitance value corresponding to the deflection of the diaphragm. The deflection is correlated to a pressure difference, and the pressure difference is equivalent to a pressure volume (Pv) of the chamber.


