Integrated CMOS-MEMS Multi-Axis Sensor Substrate

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Solution Overview

Problem

Conventional MEMS and IC technologies face challenges in increasing performance, reducing size, and decreasing cost, particularly in achieving complex microsystems with greater computational power, and they often require complex microsystems that do not exist.

Innovation Solution

The integration of multiple MEMS devices with CMOS devices on a common semiconductor substrate, using a system and method that includes a semiconductor layer, interface region, and encapsulation layer to minimize parasitic resistances and capacitances, allowing for joint fabrication and reduced off-chip connections.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If multiple MEMS devices are integrated with CMOS devices on a common substrate, then device yields and accuracy are enhanced, but manufacturing complexity increases

Engineering Contradiction:
Improvedevice yieldsVSAvoidmanufacturing complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent combines multiple MEMS devices (accelerometers, gyroscopes, pressure sensors) with CMOS circuitry on a single semiconductor substrate, creating an integrated multi-axis mechanical device system. This merging eliminates the need for separate fabrication and assembly processes, thereby enhancing device yields and reducing parasitic effects while managing manufacturing complexity through unified processing.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The integrated device performs multiple functions including acceleration sensing, gyroscopic measurement, and pressure detection within a single chip structure. This multi-functionality approach allows one device to replace multiple separate components, improving overall system reliability and yield while the standardized multi-functional design actually simplifies manufacturing compared to integrating multiple separate devices.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If multiple MEMS devices are integrated with CMOS devices, then accuracy is enhanced by minimizing parasitic effects, but device size and fabrication complexity increase

Engineering Contradiction:
ImproveaccuracyVSAvoiddevice size
Core Design Contradiction:
Measurement precisionVSLength of stationary object

Solution Approach 1:

By merging MEMS sensing elements with CMOS readout circuitry on the same substrate, the patent minimizes parasitic resistances and capacitances that would otherwise be introduced by external connections. This integration enhances measurement accuracy for acceleration, gyroscopic, and pressure sensing while keeping the overall device footprint compact through shared substrate real estate.

Inventive Principle:
Principle #5Merging (Combining)

3Ease of manufacture

If conventional separate fabrication methods are used for MEMS and CMOS devices, then manufacturing process simplicity is maintained, but production costs and parasitic effects increase

Engineering Contradiction:
Improveprocess simplicityVSAvoidproduction costs
Core Design Contradiction:
Ease of manufactureVSLoss of substance

Solution Approach 1:

The patent merges the fabrication processes for MEMS and CMOS devices into a unified joint fabrication methodology. This approach eliminates the need for separate manufacturing lines and assembly operations, reducing production costs through economies of scale and material efficiency. The integrated process also minimizes parasitic effects by avoiding external interconnections, while the standardized process actually simplifies manufacturing compared to managing multiple separate fabrication and assembly operations.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS9150406B2Multi-axis integrated MEMS devices with CMOS circuits and method therefor
Publication Date: 2015.10.06 PACIFIC RESEARCH GROUP PTE LTD
  • US9150406B2 patent drawing
  • US9150406B2 patent drawing
  • US9150406B2 patent drawing

AI summary

An integrated multi-axis mechanical device and integrated circuit system. The integrated system can include a silicon substrate layer, a CMOS device region, four or more mechanical devices, and a wafer level packaging (WLP) layer. The CMOS layer can form an interface region, on which any number of CMOS and mechanical devices can be configured. The mechanical devices can include MEMS devices configured for multiple axes or for at least a first direction. The CMOS layer can be deposited on the silicon substrate and can include any number of metal layers and can be provided on any type of design rule. The integrated MEMS devices can include, but not exclusively, any combination of the following types of sensors: magnetic, pressure, humidity, temperature, chemical, biological, or inertial. Furthermore, the overlying WLP layer can be configured to hermetically seal any number of these integrated devices.