Integrated Guide Unit for Liquid Processing Apparatus
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In liquid processing units for semiconductor wafers, the discharge of processing liquids can lead to mist generation and contamination due to the distortion of wafers during rotation, causing the liquid to collide with guide members and not be effectively directed into collection cups.
Innovation Solution
A liquid processing apparatus with a substrate holding unit that rotates around a vertical axis, featuring a guide unit integrated with the holding unit, positioned below the wafer's top surface, which guides the processing liquid into a cup while preventing mist generation by using an inclined inner peripheral surface and a groove to direct the liquid efficiently into a drain path.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a guide member is provided at substantially the same height as the wafer to guide processing liquid, then the processing liquid can be directed away from the wafer, but the wafer may be distorted due to forces applied from different positions on its end surface
Solution Approach 1:
The guide unit is positioned at a lower height level than the wafer top surface, changing the spatial dimension of liquid guidance from the wafer's horizontal plane to a lower vertical level. This allows the guide unit to intercept and redirect processing liquid without applying distorting forces to the wafer's end surface, thus preventing both mist contamination and wafer distortion simultaneously
2Shape
If the guide unit is positioned at a lower height, then wafer distortion is prevented, but the processing liquid may not be effectively guided into the collection cup
Solution Approach 1:
The guide unit incorporates an inclined guide surface that smoothly directs processing liquid from the wafer periphery toward the collection cup. This curved/inclined surface design ensures effective liquid guidance at a lower position, maintaining high discharge efficiency while preventing wafer distortion
Solution Approach 2:
The guide unit acts as an intermediary structure between the processing liquid and the collection cup, facilitating liquid transfer at a lower height. This intermediary mechanism ensures that liquid can be effectively directed into the cup without requiring the guide member to be at wafer height, thus maintaining both wafer flatness and discharge efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures secure guidance of processing liquids away from the guide unit, reducing mist formation and effective collection, even when wafers are warped, by harmonizing the wafer's periphery and integrating the guide unit with the holding unit.
Implementation Method 1
a substrate holding unit provided with a holding surface to attract and hold a bottom surface of the substrate horizontally
Implementation Method 2
a rotation driving unit configured to rotate the substrate holding unit around a vertical axis
Implementation Method 3
the guide unit including a guide surface configured to guide the processing liquid
Implementation Method 4
a rotary cup configured to rotate integrally with the substrate holding unit and guide the processing liquid towards the cup between the rotary cup and the guide unit
Data Source
AI summary
A liquid processing apparatus of the present disclosure performs a liquid processing by supplying a processing liquid to a substrate that is rotating. A substrate holding unit configured to be rotatable around a vertical axis is provided with a holding surface to attract and hold a bottom surface of the substrate horizontally. A guide unit is formed integrally with the substrate holding unit, disposed around the substrate held in the substrate holding unit, and provided at a position equal to or lower than a height of a top surface of a periphery of the substrate. The guide unit includes a guide surface configured to guide the processing liquid. A rotary cup rotates integrally with the substrate holding unit, and guides the processing liquid towards the cup between the rotary cup and the guide unit.