Integrated Inductor Layout for Low-Drop Logic Chip Power Rails

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Solution Overview

Problem

In ultra-fine processes, the reduction in the number of tracks leads to challenges in metal routing, particularly in preventing the reduction in width of metal lines and resultant voltage drops, necessitating innovative designs for improved power grid management in logic chips.

Innovation Solution

The integration of an inductive element with a winding axis parallel to the substrate surface and guard rings to shield magnetic flux, along with a specific metallization pattern configuration, enhances the energy efficiency and signal-to-noise ratio while minimizing the area occupied by the integrated circuit.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If the number of tracks is reduced in ultra-fine processes, then the area occupied by the logic chip is reduced, but the width of metal lines is reduced and voltage drops occur

Engineering Contradiction:
Improvearea occupied by logic chipVSAvoidvoltage stability
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent introduces a buried power rail (BPR) structure that extends in the vertical dimension through the substrate, rather than relying solely on planar metal tracks. The BPR includes a first conductive type region and a second conductive type region formed in the substrate, creating a three-dimensional power distribution network that provides additional current paths and reduces voltage drops without increasing the chip's planar area.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Object-affected harmful factors

If guard rings are added to shield the active region from magnetic flux, then the active region is protected from magnetic interference, but the area occupied by the integrated circuit increases

Engineering Contradiction:
Improvemagnetic flux interferenceVSAvoidarea occupied by integrated circuit
Core Design Contradiction:
Object-affected harmful factorsVSArea of stationary object

Solution Approach 1:

The patent combines the guard ring structure with the buried power rail structure. The guard rings are formed using the same conductive type regions (first and second conductive types) that constitute the BPR, merging the shielding function with the power distribution function. This integration allows the guard rings to provide magnetic flux shielding while simultaneously serving as part of the power delivery network, thereby reducing the additional area that would be required for separate shielding structures.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The buried power rail structure serves multiple functions: it provides power distribution through the substrate, acts as a shield against magnetic flux interference, and enables current recycling. The same conductive type regions that form the BPR also function as guard rings when appropriately configured, allowing a single structure to perform both power delivery and electromagnetic shielding functions.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves the degree of integration and reduces voltage drops, maintaining efficient signal transmission and energy efficiency despite the constraints of ultra-fine processes.

Implementation Method 1

first and second guard rings configured to shield the active region from magnetic flux generated from the inductive element

Methodology Applied
Scientific EffectMagnetic shielding: Magnetic Field

Implementation Method 2

inductive element disposed adjacent to the active region

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Data Source

PatentUS20240088200A1Integrated circuit
Publication Date: 2024.03.14 SAMSUNG ELECTRONICS CO LTD
  • US20240088200A1 patent drawing
  • US20240088200A1 patent drawing
  • US20240088200A1 patent drawing

AI summary

An integrated circuit including an inductive element according to some embodiments is provided. The inductive element includes a first through electrode extending in a first direction that is perpendicular to a substrate (e.g., an upper surface of the substrate), an upper metallization pattern connected to the first through electrode and extending in a second direction that is perpendicular to the first direction, and a lower metallization pattern connected to the first through electrode and extending in the second direction, wherein the upper metallization pattern and the lower metallization pattern are spaced apart from each other with the first through electrode therebetween.