Integrated Scanning Particle and Probe Microscope for Mask Inspection
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Solution Overview
Problem
The increasing integration density in the semiconductor industry poses challenges in cleaning photolithographic masks due to smaller structural dimensions and shorter exposure wavelengths, making it difficult to remove particles that impair imaging functions, and existing combinations of scanning particle and probe microscopes are cumbersome and slow to switch between modes.
Innovation Solution
A compact apparatus combining a scanning particle microscope with a scanning probe microscope, utilizing a charged particle beam and a detection structure attached to the probe, allowing for quick switching between modes and improved detection of probe deflection using a light pointer system and optimized emission of secondary electrons.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a combination of scanning particle microscope and scanning probe microscope is used, then the capability to examine and process samples is improved, but the device complexity and switching time between modes increase
Solution Approach 1:
The patent combines a scanning particle microscope and a scanning probe microscope into a single integrated apparatus. The scanning particle microscope uses a charged particle beam (electrons, ions, or molecules) for imaging and analysis, while the scanning probe microscope uses a physical probe for surface examination and manipulation. Both systems share common components including the sample stage, detection structures, and control systems, allowing seamless switching between modes without requiring separate instruments.
2Object-generated harmful factors
If cleaning processes are applied to photolithographic masks, then particles are removed, but the cleaning effectiveness decreases due to smaller structural dimensions
Solution Approach 1:
The patent replaces conventional mechanical cleaning methods with a charged particle beam-based approach. The scanning particle microscope uses focused beams of electrons, ions, or molecules to detect, locate, and remove particles from photolithographic masks. This non-contact method avoids mechanical stress that could damage the fine structures on masks, while providing precise particle removal capability suitable for modern sub-193nm wavelength lithography requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Facilitates efficient examination and processing of samples by enabling rapid mode switching and precise detection of probe deflection, enhancing the capability to handle small particles on photolithographic masks without compromising the performance of either microscope.
Implementation Method 1
optimized emission of secondary electrons
Data Source
AI summary
The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.