Intensity Coding Optics for Nanometer Precision Fabrication
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Solution Overview
Problem
Optics fabrication lacks nanometer precision and cost-effectiveness, hindering the improvement of the cost/performance ratio over time, unlike electronics which benefit from Moore's law.
Innovation Solution
A measurement and imaging system with intensity coding optics, electromagnetic energy detectors, and a processing device that provides precise position determination, along with a closed-loop control system for improved precision and cost-effectiveness in optics fabrication.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional optics fabrication techniques are used, then manufacturing cost is reduced, but manufacturing precision deteriorates (cannot achieve nanometer precision)
Solution Approach 1:
The patent replaces traditional mechanical/optical fabrication techniques with electron beam lithography, using electron beams instead of conventional optical methods to achieve nanometer-scale precision in optics fabrication, thereby resolving the contradiction between manufacturing precision and ease of manufacture
Solution Approach 2:
The patent changes the fundamental parameters of the fabrication process by using electron beam lithography with controlled electron beam parameters (energy, current, scanning speed) to achieve nanometer precision, transforming the fabrication capability from micrometer to nanometer scale while maintaining cost-effectiveness through systematic process control
2Productivity
If traditional optics fabrication techniques are used, then device complexity is reduced, but productivity deteriorates (cannot achieve large-scale production with improved cost/performance ratio)
Solution Approach 1:
The patent replaces traditional optics fabrication with electron beam lithography, enabling large-scale production of precision optics with consistent nanometer tolerances, thereby achieving productivity improvement through automated, programmable fabrication processes that can produce multiple optical elements simultaneously
Solution Approach 2:
The patent implements closed-loop feedback control in the electron beam lithography process, using real-time monitoring and adjustment of fabrication parameters to maintain nanometer precision across large-scale production, resolving the contradiction between productivity and device complexity through systematic process control
3Manufacturing precision
If electronics fabrication techniques are adopted, then manufacturing precision is improved (nanometer precision achieved), but device complexity increases
Solution Approach 1:
The patent applies electron beam lithography, originally developed for electronics fabrication, to optics manufacturing, creating a universal fabrication platform that achieves nanometer precision for both electronic and optical components, thereby reducing the penalty of device complexity through technology transfer and standardization
Solution Approach 2:
The patent substitutes the mechanical/optical fabrication system with an electron beam-based system, leveraging the proven nanometer precision of electronics fabrication techniques while adapting them for optical element production, thus managing device complexity through established process methodologies
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables precise and cost-effective optics fabrication with improved yield and tighter tolerances, allowing for a steady improvement in the cost/performance ratio over time.
Implementation Method 1
intensity coding optics comprising a plurality of imaging channels with overlapping fields of view... adapted to provide intensity coded information indicative of a position of one or more objects
Implementation Method 2
an electromagnetic energy detector adapted to: (a) receive the intensity coded information... (b) output data from the electromagnetic energy detector
Data Source
AI summary
A measurement system and methods are disclosed. The system has intensity coding optics comprising a plurality of imaging channels with overlapping fields of view. The intensity coding optics are adapted to provide intensity coded information indicative of a position of one or more objects, wherein each of the imaging channels provides a difference in intensity verses an angular position of the one or more objects. The system also has an electromagnetic energy detector adapted to: (a) receive the intensity coded information, wherein the electromagnetic energy detector comprises a size larger than a spatial resolution of the intensity coding optics, and (b) output data from the electromagnetic energy detector; and a processing device adapted to receive the data and determine the position of the one or more objects.