Interactive Double Patterning Layout Editing and Mask Assignment
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Solution Overview
Problem
Current electronic design automation (EDA) tools lack the ability to interactively design and check double patterning designs, leading to inefficiencies in layout creation and manufacturing defects due to the inability to track mask division and feasibility during lithography processes, especially for deep sub-micron semiconductor manufacturing.
Innovation Solution
An interactive layout editing method is implemented using spatial queries to check shape spacing and assign shapes to different masks, allowing for real-time correction of design errors and mask assignment flipping to resolve double patterning violations, enabling interactive checking and correction of lithography-related issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If double patterning is used to manufacture deep sub-micron semiconductor devices, then manufacturing precision is improved, but device complexity increases due to the need for multiple masks and patterns
Solution Approach 1:
The patent divides the layout geometry into multiple separate masks (first mask and second mask) that can be manufactured and applied separately. This segmentation allows each mask to be optimized for specific geometric features, improving manufacturing precision for deep sub-micron devices while managing the complexity through systematic division of the patterning task
Solution Approach 2:
The patent performs preliminary analysis and determination of mask assignments before actual manufacturing. By pre-determining which geometric features should be assigned to which mask based on spacing relationships and design rules, the system prepares the complex multi-mask structure in advance, reducing errors and improving precision during the actual lithography process
2Manufacturing precision
If batch mode checking is used for layout verification, then manufacturing precision may be maintained, but productivity decreases due to inability to provide real-time feedback during layout creation
Solution Approach 1:
The patent implements an interactive checking system that provides real-time feedback to users during layout creation and modification. The system continuously monitors layout geometries, detects potential double patterning violations as they occur, and notifies users immediately, allowing for corrective action before manufacturing. This feedback mechanism maintains layout accuracy while dramatically improving productivity by eliminating the need for time-consuming batch mode re-checking
Solution Approach 2:
The patent transitions from static batch-mode verification to dynamic interactive checking. The system actively monitors and updates layout compliance status in real-time as users modify geometries, enabling continuous validation without interrupting the design workflow. This dynamic approach maintains precision while enhancing productivity through seamless integration into the design process
3Ease of operation
If interactive layout editing is implemented for double patterning, then ease of operation improves, but device complexity increases due to need for tracking mask assignments and spacing relationships
Solution Approach 1:
The patent implements an automated system that performs the complex tracking of mask assignments and spacing relationships without requiring manual user intervention. The interactive checking system automatically analyzes geometric features, determines mask assignments, detects violations, and provides guidance for corrections. This self-service approach simplifies operation for users while the system handles the underlying complexity of tracking multiple masks and their spatial relationships
Data Source
AI summary
Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively.