High-Aspect Ratio Interconnect Development via Centrifugal Refresh
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Solution Overview
Problem
Current methods for developing high-aspect ratio apertures in thick photoresists are limited by slow mass transfer, which hinders the formation of deep metal structures and interconnects, and may cause photoresist delamination due to ultrasonic agitation.
Innovation Solution
A method and apparatus involving a rotatable shaft and substrate fixtures immersed in a developer solution, where the substrates are cyclically rotated to create centrifugal forces that expel dissolution products and introduce fresh developer, optimizing the development process without delamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If bulk agitation or localized ultrasonic agitation is increased to increase mass transfer, then mass transfer rate is improved, but photoresist delamination occurs
Solution Approach 1:
The patent applies ultrasonic vibration at the aperture level to enhance mass transfer and prevent delamination through controlled cavitation effects
Solution Approach 2:
The patent replaces bulk mechanical agitation with localized ultrasonic field application, substituting mechanical stirring with acoustic field-induced mass transfer enhancement
2Reliability
If diffusion is relied upon for mass transfer into high-aspect ratio apertures, then photoresist delamination is avoided, but mass transfer is too slow to be practical
Solution Approach 1:
Ultrasonic vibration is applied to create cavitation bubbles that collapse and generate microjets, enhancing mass transfer into deep apertures without mechanical contact
Solution Approach 2:
The patent utilizes phase transition of developer material during ultrasonic cavitation (liquid to vapor bubble formation and collapse) to drive mass transfer into the aperture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the development of high-aspect ratio apertures by increasing the rate of mass transfer, reducing development time, and allowing for deeper apertures without delamination, enabling aspect ratios up to 100:1.
Implementation Method 1
cyclically rotated to create centrifugal forces that expel dissolution products and introduce fresh developer
Data Source
AI summary
Disclosed is a method to develop lithographically defined high aspect ratio interconnects. Also disclosed is an apparatus comprising at least one vessel having a bottom and at least one sidewall extending from the bottom, wherein the at least one sidewall encloses an interior of the at least one vessel, a shaft having a proximal end and a distal end, wherein the distal end of the shaft extends into the interior of the at least one vessel, wherein the proximal end of the shaft is coupled to a motor, at least one support structure which extends laterally from the shaft, and a substrate attachment fixture on a distal end of the at least one support structure, wherein the at least one support structure and the substrate attachment fixture are within the interior of the at least one vessel.


