Interferometry Noise Reduction via Intensity Monitoring

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Solution Overview

Problem

Displacement-measuring interferometry systems in precision engineering, such as microlithography exposure systems, face limitations in accuracy due to spectrally dependent intensity fluctuations from broadband light sources, which are not effectively accounted for in current technologies.

Innovation Solution

A broadband displacement-measuring interferometry system that includes a spectrally broadband light source, sensor modules with interferometers, intensity monitors to measure light intensity fluctuations, and an electronic processing module to correct for these fluctuations, enabling precise position monitoring of objects in microlithography systems.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If broadband light source is used for displacement measuring interferometry, then the measurement range and robustness are improved, but spectrally dependent intensity fluctuations occur which limit measurement accuracy

Engineering Contradiction:
Improveposition monitoring accuracyVSAvoidintensity fluctuation stability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

An intensity monitor is introduced as an intermediary device that measures the intensity of light from the broadband source independently of the interferometer. This monitor provides feedback about intensity fluctuations, which are then used to correct the interferometer measurements, thereby compensating for the harmful intensity variations while maintaining the benefits of broadband light

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system implements a feedback mechanism where the intensity monitor continuously monitors light intensity from the broadband source and feeds this information back to the electronic processing module. The processing module uses this feedback to correct interferometer measurements in real-time, compensating for intensity fluctuations and maintaining measurement accuracy

Inventive Principle:
Principle #23Feedback

2Measurement precision

If intensity monitor is added to measure and correct intensity fluctuations, then measurement accuracy is improved, but device complexity increases

Engineering Contradiction:
Improveposition monitoring accuracyVSAvoidsystem component count
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The intensity monitor is designed to serve multiple functions: it characterizes the spectral distribution of the broadband source, monitors intensity fluctuations, and provides correction data for the interferometer measurements. This multi-functionality justifies the additional component by providing comprehensive light source characterization and correction capabilities

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system enhances the accuracy of position monitoring in microlithography exposure systems by compensating for intensity fluctuations, achieving sub-nanometer precision and improving the reliability of next-generation sensors.

Implementation Method 1

at least one sensor module comprising an interferometer configured to receive light derived from the source, direct portions of the light along separate paths, and subsequently recombine the portions of light

Methodology Applied
Scientific EffectInterference: Interference

Implementation Method 2

each sensor module further comprises a detector configured to measure the recombined light portions and produce a sensor output signal

Methodology Applied
Scientific EffectPhotoelectric Effect: Photoelectric Effect

Implementation Method 3

at least one intensity monitor, each intensity monitor comprising a detector configured to measure the intensity of additional light derived from the source and produce a monitor output signal

Methodology Applied
Scientific EffectPhotoelectric Effect: Photoelectric Effect

Data Source

PatentEP2904347B1Position monitoring system with reduced noise
Publication Date: 2018.07.18 ZYGO CORP
  • EP2904347B1 patent drawingFigure 1
  • EP2904347B1 patent drawingFigure 2
  • EP2904347B1 patent drawingFigure 3

AI summary

An interferometry system for monitoring changes in the position of an object, the system includes a spectrally broadband light source, a sensor module having an interferometer that direct portions of the light received from the source along separate paths. The system includes an intensity monitor having a detector configured to measure the intensity of additional light derived from the source and to produce a monitor output signal. The system includes an electronic processing module to process a sensor output signal based on the monitor output signal to account for intensity fluctuations in light output by the source, and determine information about the changes in the position of the object. The intensity monitor is configured to characterize the intensity fluctuations as a function of wavelength or intensity fluctuations that are spectrally correlated.