Intermediate Transfer Member Block Copolymer Resistance Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In image forming apparatuses using electrophotography, it is challenging to control the resistance of semi-conductive members while maintaining anti-filming properties, leading to issues like image defects due to resistance deviations in the circumferential direction of belts.
Innovation Solution
A member for an image forming apparatus is developed with a surface layer comprising a block copolymer containing a polyamide block and a polyether block, with a specific composition ratio of polyether to polyamide, which improves resistance control and anti-filming properties by suppressing adherence of inorganic oxides and toner components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a semi-conductive resin composition is used for the intermediate transfer member, then anti-filming property is secured, but resistance control becomes difficult and resistance deviation occurs
Solution Approach 1:
The invention changes the chemical composition parameters of the resin by specifying a particular ratio (70-90 mass% polyamide resin and 10-30 mass% polyether resin), which fundamentally alters the electrical resistance characteristics while preserving anti-filming properties. This parameter change resolves the contradiction by finding an optimal compositional balance.
Solution Approach 2:
The invention creates a composite resin material combining polyamide resin and polyether resin in specific proportions. This composite approach leverages the complementary properties of both resins: polyamide provides structural integrity and anti-filming properties, while polyether contributes to resistance control, thereby resolving the contradiction between anti-filming performance and resistance stability.
2Productivity
If thermoplastic resin composition is extruded to manufacture a belt, then production is efficient, but resistance deviation along the circumferential direction becomes large
Solution Approach 1:
The invention modifies the extrusion process parameters by controlling the melting and molding temperatures within specific ranges (polyamide resin melting point ±20°C, polyether resin melting point ±20°C). This precise temperature control ensures uniform resin flow and distribution during extrusion, maintaining resistance uniformity while preserving production efficiency.
Solution Approach 2:
The invention ensures that the resin composition maintains consistent properties throughout the entire belt structure by controlling the extrusion process. The uniform distribution of polyamide and polyether resins throughout the belt's circumferential direction eliminates local variations in resistance, resolving the contradiction between efficient production and resistance uniformity.
3Manufacturing precision
If resistance of the intermediate transfer member is not properly controlled, then image defects occur due to transfer missing and leak, but maintaining proper resistance compromises anti-filming property
Solution Approach 1:
The invention uses a composite resin system where polyamide resin (70-90 mass%) provides anti-filming properties by preventing toner adhesion, while polyether resin (10-30 mass%) provides resistance control within the semi-conductive range (10^8 to 10^13 Ω·cm). This composite material approach simultaneously achieves both resistance control and anti-filming performance without compromise.
Solution Approach 2:
The invention optimizes the compositional parameters and processing temperature parameters to achieve a dual benefit: the specific resin ratio controls electrical resistance for proper toner transfer, while the polyamide resin content maintains anti-filming properties. This parameter optimization resolves the contradiction by finding the optimal balance point.
Data Source
AI summary
A member for an image forming apparatus includes a surface layer including a block copolymer, wherein the block copolymer includes a polyamide block and a polyether block and the composition ratio of the polyether block to the polyamide block is from 0.2 to 1.5.